Lee Sang | Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd

スポンサーリンク

概要

関連著者

もっと見る

著作論文

Back-end Integration of Pt/BST/Pt Capacitor for ULSI DRAM Applications
Back-end Integration of Pt/BST/Pt Capacitor for ULSI DRAM Applications
Deposition Characteristics of (Ba, Sr)TiO_3 Thin Films by Liquid Source Metal-Organic Chemical Vapor Deposition at Low Substrate Temperatures
Variation of Electrical Conduction Phenomena of Pt/(Ba, Sr)TiO_3/Pt Capacitors by Different Top Electrode Formation Processes
A Process Integration of (Ba, Sr) TiO_3 Capacitor into 256M DRAM
Cleaning Method using H_2O_2 Buffing after Selective Silicon CMP
Cleaning Method using H_2O_2 Buffing after Selective Silicon CMP
Fabrication and Electrical Characterization of Pt/(Ba, Sr)TiO_3/Pt Capacitors for Ultralarge-Scale Integrated Dynamic Random Access Memory Applications
Innovative Al Damascene Process for Nanoscale Interconnects
Optimum TiSi_2 Ohmic Contact Process for Sub-100nm Devices
Influence of La_Sr_CoO_3 Heterostructure Electrodes on Pb(Zr, Ti)O_3 Thin Film Properties
Effect of SiO_2 Film Deposition on the Ferroelectric Properties of a Pt/Pb(Zr,Ti)O_3/Pt Capacitor
Effect of ECR CVD SiO_2 Film Deposition of Ferroelectric Properties of Pt/PZT/Pt Capacitor
Low Damage In Situ Contact Cleaning Method by a Highly Dense and Directional ECR Plasma
Effects of Encapsulating Barrier Layer on Ferroelectric Properties of Ir/IrO_2/PZT/Pt/IrO_2 Capacitor
Preparation and Electrical Properties of SrTiO3 Thin Films Deposited by Liquid Source Metal-Organic Chemical Vapor Deposition (MOCVD)
Electrical Characterizations of Pt/(Ba,Sr)TiO_3/Pt Planar Capacitors for ULSI DRAM Applications
Degradation and Recovery in the Ferroelectric Properties of Pt/Pb(Zr,Ti)O_3/Pt capacitor caused by SiO_2 Film Deposition
Degradation and Recovery in the Ferroelectric Properties of Pt/Pb(Zr,Ti)O_3/Pt capacitor caused by SiO_2 Film Deposition
Structural and Electrical Properties of Ba_Sr_TiO_3 Films on Ir and IrO_2 Electrodes
Preparation and Characterization of Iridium Oxide Thin Films Grown by DC Reactive Sputtering
Effects of Pb/Pt Top Electrode on Hydrogen-Induced Degradation in Pb(Zr, Ti)O_3(Semiconductors)
Effects of Step Coverage, Cl Content and Deposition Temperature in TiN Top Electrode on the Reliability of Ta_2O_5 and Al_2O_3 MIS Capacitor for 0.13μm Technology and Beyond

もっと見る

スポンサーリンク