OH Sejun | Semiconductor R & D Center, Samsung Electronics Co., Ltd
スポンサーリンク
概要
関連著者
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Lee Moon
Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team
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Lee M
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Yoo Cha
Semiconductor R&d Center Samsung Electronics Co. Ltd
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Lee Moon
Semiconductor R&d Center Samsung Electronics Co. Ltd
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Lee S
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee Sang
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd
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Lee Sang
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Lee S
Samsung Electronics Co. Ltd. Kyungki Kor
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Lee Moon
Semiconductor R&d Samsung Electronics Co. Ltd.
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OH Sejun
Semiconductor R & D Center, Samsung Electronics Co., Ltd
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Oh Sejun
Semiconductor R&d Center Samsung Electronics Co. Ltd
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Lee S.I.
Semiconductor R&D Division, Samsung Electronics Co., Ltd.
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Park I‐s
Storage Solution Team Dm R&d Center Samsung Electronics Co. Ltd.
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Park I
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Park I
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Moon J
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee S
Kangwon National Univ. Kangwon‐do Kor
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Lee S‐m
Seoul National Univ. Seoul Kor
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Park In
Semiconductor R & D Center Samsung Electronics Co. Ltd
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KOH Young
Semiconductor R&D Center, Samsung Electronics Co.Ltd.
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KIM Byung
Semiconductor R & D Center, Samsung Electronics Co., Ltd
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MOON Jong
Semiconductor R & D Center, Samsung Electronics Co., Ltd
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Moon Jong
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Kim Byung
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Kim B.h.
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Koh Y
Semiconductor R&d Center Samsung Electronics Co.ltd.
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Koh Young
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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KOH Young
Semiconductor R & D Center, Samsung Electronics Co., Ltd
著作論文
- Effect of SiO_2 Film Deposition on the Ferroelectric Properties of a Pt/Pb(Zr,Ti)O_3/Pt Capacitor
- Degradation and Recovery in the Ferroelectric Properties of Pt/Pb(Zr,Ti)O_3/Pt capacitor caused by SiO_2 Film Deposition
- Degradation and Recovery in the Ferroelectric Properties of Pt/Pb(Zr,Ti)O_3/Pt capacitor caused by SiO_2 Film Deposition