Degradation of Nitride/W/WN_x/Poly-Si Gate Stack by Post-Thermal Processes

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-04-30

著者

• Cho Heung-jae

  Memory R&d Division Hynix Semiconductor Inc.

• Kim Jin-woong

  Memory R&d Division Hynix Semiconductor Inc.

• Cho Heung-jae

  Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.

• Lim Kwan-yong

  Memory R&d Division Hynix Semiconductor Inc.

• Yang Hong-seon

  Memory R&d Division Hynix Semiconductor Inc.

• Yang Jun-mo

  Memory R&d Division Hynix Semiconductor Inc.

• LEE Jung-Ho

  Memory R&D Division, Hynix Semiconductor Inc.

• Oh Jae-geun

  Memory R&d Division Hynix Semiconductor Inc.

• Back Tae-sun

  Memory Research And Development Division Hynix Semiconductor Inc

• Back Tae-sun

  Memory R&d Division Hynix Semiconductor Inc.

• Jang S‐a

  Memory R&d Division Hynix Semiconductor Inc.

• Jang Se-aug

  Memory R&d Division Hyundai Electronics Ind. Co. Ltd.

• Jang Se-aug

  Memory R&d Division Hynix Semiconductor Inc.

• Park Tae-su

  Memory R&d Division Hynix Semiconductor Inc.

• Kim Yang

  Department Of Material Science And Engineering Kaist

• Lee Jung-ho

  Memory R&d Division Hynix Semiconductor Inc.

• KIM Yong

  Memory R&D Division, Hynix Semiconductor Inc.

• SOHN Hyun-Chul

  Memory R&D Division, Hynix Semiconductor Inc.

• Sohn H‐c

  Hynix Semiconductor Inc. Kyoungki‐do Kor

• Sohn Hyun-chul

  Memory R&d Division Hynix Semiconductor Inc.

• Lee J‐h

  Memory R&d Division Hynix Semiconductor Inc.

• Jang Se-aug

  R&d Division Hynix Semiconductor Inc.

• Kim Yong

  Memory R&d Division Hynix Semiconductor Inc.

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