Physical and Electrical Characteristics of Physical Vapor-Deposited Tungsten for Bit Line Process

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Physical and Electrical Characteristics of Physical Vapor-Deposited Tungsten for Bit Line Process
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Effect of Selective Oxidation Conditions on Defect Generation in Gate Oxide
Physical and Electrical Characteristics of Physical Vapor-Deposited Tungsten for Bit Line Process
Impact of In Situ NH3 Preannealing on Sub-100 nm Tungsten Polymetal Gate Electrode during the Sealing Nitride Formation

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