Preparation of Silicon-on-Insulator Wafer Using Spin Etching and a Subsequent Selective Etching Process
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-08-15
著者
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Sohn H‐c
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Sohn Hyun-chul
Memory R&d Division Hynix Semiconductor Inc.
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LEE Seong-Eun
Advanced Process Team, Memory R&D Division, Hynix Semiconductor Co., Lid.
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OH Seung-Jin
Advanced Process Team, Memory R&D Division, Hynix Semiconductor Co., Lid.
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SO Sang-Mun
Advanced Process Team, Memory R&D Division, Hynix Semiconductor Co., Lid.
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KIM Heon-Do
Advanced Process Team, Memory R&D Division, Hynix Semiconductor Co., Lid.
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CHUNG Sung-Woong
Advanced Process Team, Memory R&D Division, Hynix Semiconductor Co., Lid.
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SOHN Hyun-Chul
Advanced Process Team, Memory R&D Division, Hynix Semiconductor Co., Lid.
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So Sang-mun
Advanced Process Team Memory R&d Division Hynix Semiconductor Co. Lid.
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Kim Heon-do
Advanced Process Team Memory R&d Division Hynix Semiconductor Co. Lid.
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Oh Seung-jin
Advanced Process Team Memory R&d Division Hynix Semiconductor Co. Lid.
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Lee Seong-eun
Advanced Process Team Memory R&d Division Hynix Semiconductor Co. Lid.
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Chung Sung-woong
Advanced Process Team Memory R&d Division Hynix Semiconductor Co. Lid.
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Sohn Hyun-chul
Advanced Process Team Memory R&d Division Hynix Semiconductor Co. Lid.
関連論文
- Degradation of Nitride/W/WN_x/Poly-Si Gate Stack by Post-Thermal Processes
- Effect of Post Thermal Processes on Nitride/W/WN_x/poly-Si Gate Stack
- Impact of In Situ NH_3 Preannealing on Sub-100nm Tungsten Polymetal Gate Electrode during the Sealing Nitride Formation
- Effect of Selective Oxidation Conditions on Defect Generation in Gate Oxide
- Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr, Ti)O_3 Thin Films on Structural Stabilities of Hybrid Pt/IrO_2/Ir Stack and Single-Layer Ir Bottom Electrodes
- Preparation of Silicon-on-Insulator Wafer Using Spin Etching and a Subsequent Selective Etching Process
- Preparation of Platinum Thin Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Assisted Decomposition of (Ethylcyclopentadienyl)trimethylplatinum
- Properties of Ru Thin Films Fabricated on TiN by Metal-Organic Chemical Vapor Deposition
- Pb(Zr_xTi_)O_3 Thin Film Fabricated on Heterogeneous Under-Layer of Pt and SiO_2 in High Density Ferroelectric Random Access Memory (FeRAM) Capacitor
- Fabrication of Highly Dense Ru Thin Films by High-Temperature Metal-Organic Chemical Vapor Deposition with NH3 Gas as Ru Oxidation Suppressing Agent
- Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O3 Thin Films on Structural Stabilities of Hybrid Pt/IrO2/Ir Stack and Single-Layer Ir Bottom Electrodes
- Effect of Selective Oxidation Conditions on Defect Generation in Gate Oxide
- Impact of In Situ NH3 Preannealing on Sub-100 nm Tungsten Polymetal Gate Electrode during the Sealing Nitride Formation
- Properties of Ru Thin Films Fabricated on TiN by Metal-Organic Chemical Vapor Deposition