Electrical and Microstructural Degradation with Decreasing Thickness of (Ba, Sr)TiO_3 Thin Films Deposited by RF Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-11-15
著者
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Lee Kong-soo
Department Of Materials Engineering Hanyang University
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Park Chul-soon
Compound Semiconductor Department Micro-electronics Technology Laboratory Electronics And Telecommun
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PAEK Su-Hyon
Department of Materials Engineering, Hanyang University
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WON Jinhee
Department of Materials Engineering, Hanyang University
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CHOI Jin-Seog
Samsung Electronics, R&D Department
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PARK Chi-Sun
Department of Electronic Engineering, Hanseo University
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Won Jinhee
Department Of Materials Engineering Hanyang University
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Paek S‐h
Hanyang Univ. Seoul Kor
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Park C‐s
Electronics And Telecommunications Res. Inst. Taejeon Kor
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Choi Jin-seog
Samsung Electronics R&d Department
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Paek Su-hyon
Department Of Materials Engineering Hanyang University
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- Electrical and Microstructural Degradation with Decreasing Thickness of (Ba, Sr)TiO_3 Thin Films Deposited by RF Magnetron Sputtering
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