BC(Body-Contacted) SOI-CMOS Technology and Its Application to High Density Memory
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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Lee Jong-wook
Silicon Systems Research Labs.
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Lee J‐w
Technology Development Semiconductor R&d Center Samsung Electronics Co.
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Oh Jeong-hee
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
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Oh Min-rok
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
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Koh Yo-hwan
Memory R & D Division Hyundai Electronics Industries Co. Ltd.
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Koh Yo-hwan
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd
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Lee Jong-Wook
Semicoductor Research Division, Hyundai Electronics Industries Co., Ltd.
関連論文
- Endurance Characteristics and Degradation Mechanism of Polysilicon Thin Film Transistor EEPROMs with Electron Cyclotron Resonance N_2O-Plasma Gate Oxide
- High-Performance EEPROMs Using N- and P-Channel Poly-Si TFTs with ECR N2O-Plasma Oxide
- Effect of Bottom Polysilicon Doping on the Reliability of Interpoly Oxide Grown Using Electron Cyclotron Resonence N_2O-Plasma
- Short Channel Effects in N- and P-Channel Polycrystalline Silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N_2O-Plasma Gate Dielectric
- Short-Channel Effects in N- and P-Channel Polysilicon Thin Film Transistors with Very Thin ECR N_2O-Plasma Gate Dielectrics
- Highly Reliable Interpoly Oxide Using ECR N_2O-Plasma for Next Generation Flash Memory
- The Effect of Al/Pt Interface Reaction on Lead-zirconate-titanate Capacitor and the Optimization of Via Contact for Double Metal Ferroelectric RAM
- An Optimized Via Contact Scheme of FeRAM for Double-Level Metallization and Beyond
- Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology
- Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology
- Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology
- Effects of buried oxide stress on thin-film silicon-on-insulator metal-oxide-semiconductor field-effect-transistor
- Dependence of Contact Resistance on Substrate Doping and Impact of Mixed Ion Implantation
- BC(Body-Contacted) SOI-CMOS Technology and Its Application to High Density Memory
- Effects of buried oxide stress on thin-film silicon-on-insulator metal-oxide-semiconductor field-effect-transistor
- EVALUATION OF SOI WAFERS USING C-V CHARACTERISTICS OF THIN-FILM MOS CAPACTOR
- EVALUATION OF SOI WAFERS USING C-V CHARACTERISTICS OF THIN-FILM MOS CAPACTOR
- ELFIN (ELevated Field INsulator) and SEP (S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs
- ELFIN (ELevated Field INsulator) and SEP (S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs