Kim Yong | Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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概要
関連著者
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Kim Yong
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Kim Yong
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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Kim Yong
Semiconductor Materials and Devices Lab, Korea Institute of Science and Technology
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Min Suk-ki
Semiconductor Mat. Lav.
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LEE Chang
Department of Oral Biology, Yonsei University College of Dentistry
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Min S‐k
Korea Univ. Chungnam Kor
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Choi In-hoon
Department Of Materials Science Korea University
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Lee Chang
Semiconductor Materials Laboratory Korea Institute Of Science And Technology:(present Address)depart
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PARK Seoung-Hwan
Department of Physics, Catholic University of Taegu
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Choe B‐d
Seoul National Univ. Seoul Kor
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GHO Seok-Jung
Department of Physics, Kookmin University
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LIM H.
Department of Electronic Engineering, Ajou University
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CHOE Byung-Doo
Department of Physics, Seoul National University
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KO Min
Department of Physics, Kookmin University
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Park Seoung-hwan
Department Of Physics Daeyu Hyosung Catholic University
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Park Seoung-hwan
Department Of Electronic Engineering Catholic University Of Daegu
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Gho Seok-jung
Department Of Physics Kookmin University
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Ko Min
Department Of Physics Kookmin University
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Lee Chang
Department Of Animal Science Utsunomiya University
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Ko Min
Department Of Fiber And Polymer Science Seoul National University
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Shin Dong
Korea Department Of Materials Science Korea University
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Choi In-hoon
Department Of Material Science Korea University
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Choe Byung-doo
Department Of Material Physics Faculty Of Engineering Science Osaka University
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KWON Chul
Micro Process Development, Samsung Electronics
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Kwon Chul
Micro Process Development Samsung Electronics
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HAN Yong
Korea Department of Materials Science, Korea University
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Han Yong
Korea Department Of Materials Science Korea University
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Lee Chang
Departlnent Of Biology College Of Natural Sciences Kyungpook National University Korea
著作論文
- Negative Resistance of AlGaAs Diodes Co-doped with Si and Mn
- The Characteristics of Nitrogen Implanted Tungsten Film as a New Diffusion Barrier for Metal Organic Chemical Vapor Deposited Cu Metallization
- Performance of the Plasma-Deposited Tungsten Nitride Diffusion Barrier for Al and Au Metallization
- A Proposal of Pt/SrBi_2Ta_2O_9/CeO_2/Si Structure for Non Destructive Read Out Memory Devices