Accurate Evaluation of Silicon Planar Doping in InAlAs for InAlAs/InGaAs Modulation Doped Structure Grown by Metal Organic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-06-15
著者
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ITO Hiroshi
NTT LSI Laboratories
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Ito Hiroki
Development Department Mitsubishi Electric Corporation
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Ito H
Department Of Energy And Environmental Science Graduate School Of Utsunomiya University
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TOMIZAWA Masaaki
NTT LSI Laboratories
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KURISHIMA Kenji
NTT LSI Laboratories
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ENOKI Takatomo
NTT LSI Laboratories
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ISHII Yasunobu
NTT LSI Laboratories
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Ishii Y
Waseda Univ. Tokyo Jpn
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Enoki Takatomo
Ntt Photonics Laboratories
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Ishii Y
Yamaguchi Univ. Ube‐shi Jpn
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Kurishima Kenji
Ntt Photonics Laboratories Ntt Corporation
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Tomizawa M
Ntt System Electronics Lab. Kanagawa Jpn
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Tomizawa Masaaki
Ntt Lifestyle And Environmental Technology Labs
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