Growth and Characterization of High-Speed Carbon-Doped-Base InP/InGaAs Heterojunction Bipolar Transistors by Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-06-15
著者
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Yamahata Shoji
Ntt Photonics Laboratories
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Shigekawa Naoteru
NTT Photonics Laboratories
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ITO Hiroshi
NTT LSI Laboratories
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Ito Hiroki
Development Department Mitsubishi Electric Corporation
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Ito H
Department Of Energy And Environmental Science Graduate School Of Utsunomiya University
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MATSUOKA Yutaka
NTT Opto-electronics Laboratories
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Matsuoka Y
Ntt Lsi Lab. Atsugi‐shi Jpn
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YAMAHATA Shoji
NTT LSI Laboratories
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SHIGEKAWA Naoteru
NTT LSI Laboratories
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KURISHIMA Kenji
NTT LSI Laboratories
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Shigekawa Naoteru
Ntt Science & Core Technology Laboratory
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Shigekawa Naoteru
Institute For Solid State Physics The University Of Tokyo:electro-communication Laboratory Ntt K.k.
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Matsuoka Yasunobu
Central Research Laboratory Hitachi Ltd.
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Yamaguchi S
Faculty Of Agriculture University Of Ehime
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Kurishima Kenji
Ntt Photonics Laboratories Ntt Corporation
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