High-Speed Uni-Traveling-Carrier Photodiodes Monolithically Integrated with InP Heterojunction Bipolar Transistors using Be Ion Implantation
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概要
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Uni-traveling-carrier photodiodes (UTC-PDs) can be monolithically integrated with InP heterojunction bipolar transistors (HBTs) using Be ion implantation and rapid thermal annealing (RTA) for an activation of implanted Be. UTC-PDs share the base and collector layers of the HBTs; the photoabsorption layer of the UTC-PD is formed by selectively doping the collector with Be. The fabricated UTC-PDs exhibit an output voltage of over 0.5 V and a 3-dB bandwidth of 100 GHz. The HBTs fabricated on the same wafer provide a peak $ f_{\text{t}}$ of 150 GHz and a peak $ f_{\text{max}}$ of 250 GHz at a collector current density of 1 mA/μm2. The RTA used to fabricate the UTC-PDs does not seriously degrade the current gain of the HBTs. These results indicate that Be ion implantation is a promising technique for integrating UTC-PDs and InP HBTs on the same wafer.
- 2006-10-15
著者
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Yamahata Shoji
Ntt Photonics Laboratories
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SANO Kimikazu
NTT Photonics Laboratories
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Ida Minoru
Ntt Photonics Laboratories Ntt Corporation
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Kurishima Kenji
Ntt Photonics Laboratories Ntt Corporation
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Kashio Norihide
Ntt Photonics Laboratories Ntt Corporation
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Sano Kimikazu
NTT Photonics Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Yamahata Shoji
NTT Photonics Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Kashio Norihide
NTT Photonics Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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