Preparation of Nd-Doped SiO_2 Glass by Plasma Torch CVD

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概要

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• Silica glass has not been fully characterized as a host material for glass lasers. To evaluate the intrinsic fluorescent characteristics of Nd-doped SiO_2 glass, a plasma torch CVD system was specially designed for the preparation of clear high purity glasses. Both of the observed fluorescences of Nd^<3+> (^4F_<3/2>-^4I_<9/2> and ^4F_<3/2>-^4I_<11/2>) consist of a fast (τ⋍0.35μs) and a slow (τ⋍450μs) decay component. The spectral features and intensity of the former remarkably depend on Nd concentration and preparation conditions, while those of the latter are similar in every sample and its fluorescence peak positions distinctly shift to a wavelength longer than those observed in ordinary multicomponent glasses.

• 社団法人応用物理学会の論文
• 1982-06-20

著者

• ARAI Kazuo

  Electrotechnical Laboratory

• Arai K

  Department Of Biochemistry And Chemical Engineering Graduate School Tohoku University

• Ishii Y

  Waseda Univ. Tokyo Jpn

• Kumata K

  Ibm Research Tokyo Research Laboratory

• NAMIKAWA Hiroshi

  Electrotechnical Laboratory

• ISHII Yoshiro

  Science University of Tokyo

• KUMATA Ken

  Electrotechnical Laboratory

• TANAKA Hiroaki

  Science University of Tokyo

• Namikawa H

  Nippon Sanso K.k. Kawasaki

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