Fluorescence and its Nd^<3+> Concentration Dependence of Nd-Doped SiO_2 Glasses Prepared by Plasma Torch CVD

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概要

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• The time resolved fluorescence spectra and their Nd^<3+> concentration C_<Nd> dependence were observed in Nd-doped SiO_2 glasses prepared by plasma torch CVD. The ^4F_<3/2> radiative emissions observed consist of a fast (FDC,τ_m≃0.35μs) and a slow (SDC,τ_m≃470μs) decay component. The FDC are characterized by the intensity ratio (^4F_<3/2>-^4I_<11/2>/^4F_<3/2>-^4I_<9/2>>1), but the SDC by the inverse ratio and the spectral shift to the longer wavelength. The SDC increases and reaches almost constant values in higher C_<Nd>. The FDC can not be observed in very low C_<Nd> region, but increases abraptly in higher C_<Nd>. The FDC is ascribed to the Nd^<3+> in the clustering microstructure and the SDC is ascribed to the isolated Nd^<3+> in crystal field unique to unitary SiO_2 glass.

• 社団法人応用物理学会の論文
• 1983-07-20

著者

• ARAI Kazuo

  Electrotechnical Laboratory

• Arai K

  Department Of Biochemistry And Chemical Engineering Graduate School Tohoku University

• Ishii Y

  Waseda Univ. Tokyo Jpn

• Kumata K

  Ibm Research Tokyo Research Laboratory

• NAMIKAWA Hiroshi

  Electrotechnical Laboratory

• ISHII Yoshiro

  Science University of Tokyo

• KUMATA Ken

  Electrotechnical Laboratory

• IIDA Ichio

  Science University of Tokyo

• TANAKA Hiroaki

  Science University of Tokyo

• IIDA Ichio

  Electrotechnical Laboratory

• Namikawa H

  Nippon Sanso K.k. Kawasaki

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