Monte Carlo Analysis of Hot Electron Transport and Impact Ionization in Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-12-30
著者
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Sano Naokatsu
School Of Science Kwansei Gakuin University
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Sano N
Tokyo Inst. Technol. Tokyo Jpn
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Sano Nobuyuki
Ntt Lsi Laboratories
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TOMIZAWA Masaaki
NTT LSI Laboratories
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YOSHII Akira
NTT LSI Laboratories
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Tomizawa Masaaki
Ntt Lifestyle And Environmental Technology Labs
関連論文
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- Observation of Laser-Induced Melting of Silicon Film Followed by Amorphization
- Surface Corrugation of GaAs Layers Grown on (775)B-Oriented GaAs Substrates by Molecular Beam Epitaxy
- Extremely Flat Interfaces in In_xGa_As/Al_Ga_As Quantum Wells Grown on (411)A GaAs Substrates by Molecular Beam Epitaxy
- Extremely Flat Interfaces in In_xGa_As/Al_Ga_As Quantum Wells Grown on (411)A GaAs Substrates by MBE
- High-Density GaAs/AlAs Quantum Wires Grown on (775)B-Oriented GaAs Substrates by Molecular Beam Epitaxy
- Highly Uniform GaAs/AIAs Quantum Wires Grown on [001] Ridges of GaAs(100) Patterned Substrates by Molecular Beam Epitaxy
- Extremely Flat Interfaces in GaAs/AlGaAs Quantum Wells Grown on GaAs (411)A Substrates by Molecular Beam Epitaxy
- Temperature Dependence of Molecular Beam Epitaxial Growth Rates for In_xGa_As and In_xAl_As
- Monte Carlo Analysis of Hot Electron Transport and Impact Ionization in Silicon
- Novel Dual Wavelength Electro-Optical Bistability in InGaAs/AlGaAs Multiple Quantum Wells
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