Improvement of Gate-Insulator/Silicon Interface Characteristics in Amorphous Silicon Thin Film Transistors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-06-15
著者
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Sano Naokatsu
Faculty Of Science Kwansei-gakuin University
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Sano Naokatsu
Department Of Physics School Of Science Kwansei Gakuin University
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Sano Naokatsu
School Of Science Kwansei Gakuin University
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Sameshima T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Sameshima Toshiyuki
Sony Research Center
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Sameshima Toshiyuki
Sony Corporation Research Center
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KOHNO Atsusi
Faculty of Science, Kyushu University
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SEKIYA Mitsunobu
Sony Research Center
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HARA Masaki
Sony Research Center
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SANO Naoki
Sony Research Center
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Kohno Atsusi
Faculty Of Science Kyushu University
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Hara M
Frontier Research Program The Institute Of Physical And Chemical Research (riken)
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