Boron Doping Effects in Lateral Solid Phase Epitaxy of Amorphous Si Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1985-07-20

著者

• FURUKAWA Seijiro

  Graduate School of Science and Engineering, Tokyo Institute of technology

• ISHIWARA Hiroshi

  Graduate School of Science

• Ishiwara Hiroshi

  Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering

• Ishiwara Hiroshi

  Precision & Intelligence Laboratory Tokyo Institute Of Technology

• Yamamoto H

  Sharp Corp. Nara Jpn

• Yamamoto H

  College Of Science And Technology Nihon University

• Ishiwara H

  Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering

• Tamba Akihiro

  Graduate School Of Science And Engineering Tokyo Institute Of Technology:(present Address)hitachi Re

• FURUKAWA Seigo

  Department of Electronics, Nippondenso Technical College

• Yamamoto Hiroshi

  Graduate School of Science and Engineering, Tokyo Institute of Technology

• Furukawa S

  Kyushu Inst. Technology Fukuoka Jpn

• Furukawa Seijiro

  Graduate School Of Science And Engineering Tokyo Institute Of Technology

• Yamamoto Hiroshi

  Graduate School Of Environmental Science Hokkaido University

• Yamamoto Hiroshi

  Graduate School Of Engineering Utsunomiya University

• Yamamoto Hiroshi

  Graduate School of Engineering Science, Osaka University

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