Current Paths over Grain Boundaries in Polycrystalline Silicon Films : Semiconductors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2001-02-01

著者

• 木村 睦

  龍谷大学電子情報学科

• 井上 聡

  セイコーエプソン株式会社フロンティアデバイス研究所

• 下田 達也

  Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology

• 木村 睦

  Department Of Electronics And Informatics Ryukoku University

• KIMURA Mutsumi

  Ryukoku University

• SHIMODA Tatsuya

  Seiko Epson Corporation

• INOUE Satoshi

  Base Technology Research Center, Seiko Epson Corp.

• SHIMODA Tatsuya

  Base Technology Research Center, Seiko Epson Corp.

• KIMURA Mutsumi

  Base Technology Research Center, Seiko Epson Corporation

• SAMESHIMA Toshiyuki

  Division of Electric and Information Engineering, Tokyo University of Agriculture and Technology

• Kimura Mutsumi

  Ryukoku University:innovative Materials And Processing Research Center

• Shimoda Tatsuya

  Seiko Epson Corp. Nagano Jpn

• Shimoda Tatsuya

  Base Technology Research Center Seiko Epson Corporation

• Shimoda Tatsuya[

  Base Technology Research Center Seiko Epson Corporation

• Kimura M

  Department Of Electrical Engineering Kure National College Of Technology

• Kimura Mutsumi

  Base Technology Research Center Seiko Epson Corporation

• Kimura Mutsumi

  Ryukoku Univ. Otsu‐shi Jpn

• 下田 達也

  Seiko Epson Corporation

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