Shimoda Tatsuya | Base Technology Research Center Seiko Epson Corporation
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概要
関連著者
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Shimoda Tatsuya
Base Technology Research Center Seiko Epson Corporation
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SHIMODA Tatsuya
Base Technology Research Center, Seiko Epson Corp.
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INOUE Satoshi
Base Technology Research Center, Seiko Epson Corp.
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Kimura Mutsumi
Base Technology Research Center Seiko Epson Corporation
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井上 聡
セイコーエプソン株式会社フロンティアデバイス研究所
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SHIMODA Tatsuya
Seiko Epson Corporation
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下田 達也
Seiko Epson Corporation
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木村 睦
龍谷大学電子情報学科
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下田 達也
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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KIMURA Mutsumi
Base Technology Research Center, Seiko Epson Corporation
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Kimura Mutsumi
Ryukoku University:innovative Materials And Processing Research Center
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Shimoda Tatsuya[
Base Technology Research Center Seiko Epson Corporation
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KIMURA Mutsumi
Ryukoku University
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Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
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Kimura M
Department Of Electrical Engineering Kure National College Of Technology
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Kimura Mutsumi
Ryukoku Univ. Otsu‐shi Jpn
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木村 睦
Department Of Electronics And Informatics Ryukoku University
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Nozawa Ryoichi
Base Technology Research Center Seiko Epson Corporation
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Inoue S
Seiko Epson Corporation
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野澤 陵一
セイコーエプソン株式会社OLED技術開発部
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Shimoda T
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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Shimoda Tatsuya
Seiko Epson Corporation Technology Platform Research Center
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NOZAWA Ryoichi
Base Technology Research Center, Seiko Epson Corporation
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LUI Basil
Epson Cambrodge Laboratory
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TAM Simon
Epson Cambridge Laboratory
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SAMESHIMA Toshiyuki
Division of Electric and Information Engineering, Tokyo University of Agriculture and Technology
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Migliorato Piero
Department Of Engineering University Of Cambridge
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MIYAZAWA Hiromu
Technology Platform Research Center, SEIKO EPSON CORPORATION
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NATORI Eiji
Technology Platform Research Center, SEIKO EPSON CORPORATION
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MIYAZAWA Hiromu
Base Technology Research Center, Seiko Epson Corporation
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NATORI Eiji
Base Technology Research Center, Seiko Epson Corporation
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OGUCHI Tamio
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Ishi Fumiyuki
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Oguchi T
Hiroshima Univ. Hiroshima Jpn
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Oguchi Tamio
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Natori Eiji
Seiko Epson Corporation Technology Platform Research Center
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Ishii F
Hiroshima Univ. Hiroshima Jpn
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Miyazawa H
Base Technology Research Center Seiko Epson Corporation
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Lui Basil
Epson Cambridge Laboratory, 8c King's Parade, Cambridge CB2 1SJ, United Kingdom
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TAM Simon
Cambridge Research Laboratory of Epson
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Lui BaSil
エプソンケンブリッジ研究所
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Migliorato Piero
ケンブリッジ大学工学部
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Abe Daisuke
Frontier Device Research Center Seiko Epson Corporation
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Tam S
Cambridge Research Laboratory Of Epson
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Lui B
Epson Cambridge Lab. Cambridge Gbr
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HIGASHI Seiichiro
Base Technology Research Center, Seiko Epson Corp.
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ABE Daisuke
Base Technology Research Center, Seiko Epson Corp.
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MIGLIORATO Piero
Department of Engineering, University of Cambridge
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Migliorato Piero
Univ. Cambridge Cambridge Gbr
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KISHIMOTO Hiroki
Graduate School of Advanced Sciences of Matter, Hiroshima University
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ISHI Fumiyuki
Graduate School of Advanced Sciences of Matter, Hiroshima University
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MIYASHITA Satoru
Base Technology Research Center, Seiko Epson Corporation
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ISHII Fumiyuki
Graduate School of Advanced Sciences of Matter, Hiroshima University
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SAMESHIMA Toshiyuki
Department of Electrical and Electric Engineering, Tokyo University of Agriculture and Technology
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Ishida Masaya
Base Technology Research Center Seiko Epson Corporation
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Ishida Masaya
Base Technology Research Center Seiko Epson Co.
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KASUGA Mayumi
Meterial Analysis and Research Center Seiko Epson Corporation
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KANEKO Takeo
Base Technology Research Center, Seiko Epson Corporation
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EGUCHI Tsukasa
LT Business Development Center, Seiko Epson Corporation
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Miyashita Satoru
Base Technology Research Center Seiko Epson Corporation
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Eguchi Tsukasa
Lt Business Development Center Seiko Epson Corporation
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木村 睦
龍谷大学 理工学部 電子情報学科
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Kishimoto Hiroki
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Higashi S
Seiko Epson Corporation Technology Platform Research Center
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Kaneko Takeo
Base Technology Research Center Seiko Epson Corporation
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Tam Simon
Epson Cambridge Laboratory, 8c King's Parade, Cambridge CB2 1SJ, United Kingdom
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Migliorato Piero
Department of Engineering, University of Cambridge, Trumpington Street, Cambridge CB2 1PZ, United Kingdom
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Kimura Mutsumi
Base Technology Research Center, Seiko Epson Corporation, 281 Fujimi, Nagano 399-0293, Japan
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Shimoda Tatsuya
Base Technology Research Center, Seiko Epson Corporation, 281 Fujimi, Nagano 399-0293, Japan
著作論文
- Low-Temperature Formation of Device-Quality SiO_2/Si Interfaces Using Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition
- Extraction of Trap States at the Oxide-Silicon Interface and Grain Boundary for Polycrystalline Silicon Thin-Film Transistors : Semiconductors
- Current Density Enhancement at Active Layer Edges in Polycrystalline Silicon Thin-Film Transistors : Semiconductors
- Relationship between Lattice Deformation and Polarization in BaTiO_3
- Electronic States of Perovskite-Type Oxides and Ferroelectricity
- Device Simulation of Carrier Transport through Grain Boundaries in Lightly Doped Polysilicon Films and Dependence on Dopant Density : Semiconductors
- Current Paths over Grain Boundaries in Polycrystalline Silicon Films : Semiconductors
- Selective Deposition of Electroless Plating Films Using the Difference between the Functional Groups of Self-Assembled Monolayers
- Device Simulation of grain Boundaries with Oxide-Silicon Interface Roughness in Laser-Crystallized Polycrystalline Silicon Thin-Film Transistors
- 24.4:Investigation of Hot Carrier Degradation Due to AC Stress in Low Temperature Poly-Si TFTs(発表概要)(Report on 2000 SID International Symposium)
- Extraction of Trap States at the Oxide-Silicon Interface and Grain Boundary in Polycrystalline Silicon Thin-Film Transistors
- Device Simulation of Grain Boundaries in Lightly Doped Polysilicon Films and Analysis of Dependence on Defect Density