Kimura Mutsumi | Ryukoku University:innovative Materials And Processing Research Center
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概要
関連著者
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Kimura Mutsumi
Ryukoku University:innovative Materials And Processing Research Center
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木村 睦
Department Of Electronics And Informatics Ryukoku University
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木村 睦
龍谷大学電子情報学科
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井上 聡
セイコーエプソン株式会社フロンティアデバイス研究所
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下田 達也
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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KIMURA Mutsumi
Ryukoku University
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SHIMODA Tatsuya
Seiko Epson Corporation
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Shimoda Tatsuya[
Base Technology Research Center Seiko Epson Corporation
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AKAHANE Tadashi
Department of Electrical Engineering, Nagaoka University of Technology
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Kimura M
Department Of Electrical Engineering Kure National College Of Technology
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KIMURA Munehiro
Department of Electrical Engineering, Faculty of Engineering, Nagaoka University of Technology
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Kimura Mutsumi
Ryukoku Univ. Otsu‐shi Jpn
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下田 達也
Seiko Epson Corporation
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Inoue S
Seiko Epson Corporation
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Akahane T
Department Of Electrical Engineering Faculty Of Engineering Nagaoka University Of Technology
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Akahane T
Faculty Of Engineering Nagaoka University Of Technology
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INOUE Satoshi
Base Technology Research Center, Seiko Epson Corp.
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SHIMODA Tatsuya
Base Technology Research Center, Seiko Epson Corp.
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KIMURA Mutsumi
Base Technology Research Center, Seiko Epson Corporation
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Shimoda Tatsuya
Base Technology Research Center Seiko Epson Corporation
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Kimura Mutsumi
Base Technology Research Center Seiko Epson Corporation
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INOUE Satoshi
Seiko Epson Corporation
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Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
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Inoue S
Frontier Device Research Center Seiko Epson Corporation
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Izumi S
Division Of Oral Cytology And Cell Biology Nagasaki University Graduate School Of Biomedical Science
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KIMURA Mutsumi
Department of Electronics and Informatics, Ryukoku University
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INOUE Satoshi
Technology Platform Research Center, Seiko Epson Cooperation
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SHIMODA Tatsuya
Technology Platform Research Center, Seiko Epson Cooperation
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TAM Simon
Cambridge Research Laboratory of Epson
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野澤 陵一
セイコーエプソン株式会社OLED技術開発部
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Nozawa Ryoichi
Base Technology Research Center Seiko Epson Corporation
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TORIUMI Hirokazu
Department of Chemistry, College of Arts and Science, The University of Tokyo
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TANAKA Norihiko
Department of Electrical Engineering, Faculty of Engineering, Nagaoka University of Technology
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OKUTANI Satoshi
Department of Electrical Engineering, Faculty of Engineering, Nagaoka University of Technology
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Okutani Satoshi
Department Of Electrical Engineering Faculty Of Engineering Nagaoka University Of Technology
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Kimura Munehiro
Department Of Electrical Engineering Faculty Of Engineering Nagaoka University Of Technology
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Tanaka Norihiko
Department Of Electrical Engineering Faculty Of Engineering Nagaoka University Of Technology
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MATSUHASHI Nobuaki
Department of Electrical Engineering, Hachinohe National College of Technology
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OKUMOTO Yoshitaka
Department of Electrical Engineering, Faculty of Engineering, Nagaoka University of Technology
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Matsuhashi Nobuaki
Department Of Electrical Engineering Hachinohe National College Of Technology
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Akahane Tadashi
Department Of Electrical Engineering Faculty Of Engineering Nagaoka University Of Technology
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Akahane Tadashi
Deparment Of Electrical Engineering Faculty Of Engineering The Technological University Of Nagaoka
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HARADA Kiyoshi
Department of Electronics and Informatics, Ryukoku University
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YASUHARA Tohru
Department of Electronics and Informatics, Ryukoku University
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HARA Yuji
Ryukoku University
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HARA Hiroyuki
Seiko Epson Corporation
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Lui BaSil
エプソンケンブリッジ研究所
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Migliorato Piero
ケンブリッジ大学工学部
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Abe Daisuke
Frontier Device Research Center Seiko Epson Corporation
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Tam S
Cambridge Research Laboratory Of Epson
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Lui B
Epson Cambridge Lab. Cambridge Gbr
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NOZAWA Ryoichi
Base Technology Research Center, Seiko Epson Corporation
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Yasuhara Tohru
Department Of Electronics And Informatics Ryukoku University
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Migliorato Piero
Univ. Cambridge Cambridge Gbr
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Hara Hiroyuki
Seiko Epson Corp. Nagano Jpn
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Kimura Mutsumi
Ryukoku Univ. Otsu Jpn
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corp.
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木村 睦
龍谷大学 理工学部 電子情報学科
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井上 聡
セイコーエプソン(株)フロンティアデバイス研究所
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下田 達也
セイコーエプソン 基盤技術研究所
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下田 達也
セイコーエフ゜ソン株式会社 Tprc 第四研究ク゛ルーフ゜
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Akao Ken-ichi
JASCO Corporation
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木村 睦
セイコーエプソン(株)基盤技術研究所
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YOSHINO Takuto
Department of Electronics and Informatics, Ryukoku University
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ABE Daisuke
Frontier Device Research Center, Seiko Epson Corporation
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INOUE Satoshi
Frontier Device Research Center, Seiko Epson Corporation
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SHIMODA Tatsuya
Center for Nano Materials and Technology, Japan Advanced Institute of Science and Technology
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OKUYAMA Tomoyuki
Seiko Epson Corporation
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ABE Daisuke
Technology Platform Research Center, Seiko Epson Cooperation
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KIMURA Mutsumi
Technology Platform Research Center, Seiko Epson Corporation
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Tam Simon
エプソンケンブリッジ研究所
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LUI Basil
Epson Cambrodge Laboratory
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TAM Simon
Epson Cambridge Laboratory
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MIGLIORATO Piero
Department of Engineering, University of Cambridge
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SAMESHIMA Toshiyuki
Division of Electric and Information Engineering, Tokyo University of Agriculture and Technology
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木村 睦
セイコーエプソン 基盤技研
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Migliorato Piero
Department Of Engineering University Of Cambridge
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Ohta Yasuyuki
Department of Rehabilitation, Nishikyusyu University
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SAMESHIMA Toshiyuki
Department of Electrical and Electric Engineering, Tokyo University of Agriculture and Technology
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Akao Ken-ichi
Spectroscopic Instruments Division Jasco Corporation
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Kimura Mutsumi
Technology Platform Research Center Seiko Epson Corporation
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Harada Kiyoshi
Department Of Electronics And Informatics Ryukoku University
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Yoshino Takuto
Department Of Electronics And Informatics Ryukoku University
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Kato Masakazu
Osaka University
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TADOKORO Toshiyasu
Special Reserch laboratory for Optical Science, Kanagawa Academy of Science and Technology
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Yoshisato Yorinobu
Tsukuba Research Center Sanyo Electric Co. Ltd.
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Yoshisato Yorinobu
Functional Materials Research Center Sanyo Electric Co. Ltd.
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Koyama H
Mitsubishi Electric Corp. Hyogo Jpn
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SAWAMURA Shigeki
Nara Institute of Science and Technology
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SUZUKI Daisuke
Ryukoku University
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EGUCHI Tsukasa
LT Business Development Center, Seiko Epson Corporation
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OKUBO Katsuhiro
Department of Electrical Engineering, Faculty of Engineering, Nagaoka University of Technology
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TADOKORO Toshiyasu
Spectroscopic Instruments Division, JASCO Corporation
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YOSHIHARA Toshiaki
Display Laboratory, Fujitsu Laboratories Ltd.
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TADOKORO Toshiyasu
JASCO Corporation
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KOYAMA Hiroshi
ULSI Laboratory, Evaluation amp Analysis Center, Mitsubishi Electric Corporation
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Okubo Katsuhiro
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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TADOKORO Takashi
NTT Opto-electronics Laboratories
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Kimura Mikihiro
Ulsi Laboratory Mitsubishi Electric Corporation
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Yamamoto Hidekazu
ULSI Development Center, Mitsubishi Electric Corporation
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YOSHIDA Yoshiko
ULSI Laboratory, Mitsubishi Electric Corp.
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KUME Morihiko
ULSI Laboratory, Mitsubishi Electric Corp.
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Kume Morihiko
Ulsi Laboratory Mitsubishi Electric Corp.
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Yoshida Y
Yamaguchi Univ. Ube‐shi Jpn
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Eguchi Tsukasa
Lt Business Development Center Seiko Epson Corporation
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Okuyama Tomoyuki
Seiko Epson Corp. Nagano Jpn
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AKAO Kenichi
JASCO Corporation
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Okumoto Yoshitaka
Department Of Electrical Engineering Faculty Of Engineering Nagaoka University Of Technology
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Toriumi Hirokazu
Department Of Chemistry College Of Arts And Sciences The University Of Tokyo
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Toriumi Hirokazu
Department Of Chemistry College Of Arts And Science The University Of Tokyo
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Yamamoto H
Toshiba Corp. Kawasaki‐shi Jpn
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Yamamoto Hidekazu
Ulsi Development Center Mitsubishi Electric Corporation
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Koyama Hiroshi
Ulsi Development Center Mitsubishi Electric Corporation:(present Address)jeol Limited
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Kimura Mutsumi
Department of Chemistry, Graduate School of Natural Science and Technology, Okayama University
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Lui Basil
Epson Cambridge Laboratory, 8c King's Parade, Cambridge CB2 1SJ, United Kingdom
著作論文
- Extraction Technique of Trap Density at Grain Boundaries in Polycrystalline-Silicon Thin-Film Transistors with Device Simulation
- Classification of Driving Methods for TFT-OLEDs and Novel Proposal Using Time Ratio Grayscale and Current Uniformization(Electronic Displays)
- 表側と裏側の絶縁膜界面にトラップ準位をもつポリシリコン薄膜トランジスタのデバイスシミュレーション(ディスプレイ-IDW'03関連-)
- Extraction of Trap Densities at Front and Back Interfaces in Thin-Film Transistors
- Numerical Model of Thin-Film Transistors for Circuit Simulation Using Spline Interpolation with Transformation by y=x + log(x)(Regular Section)
- 多結晶シリコン薄膜トランジスタの絶縁膜-シリコン界面と結晶粒界のトラップ準位の抽出(低温または高温多結晶Siとアクティブマトリックス型ディスプレイ用薄膜トランジスタ論文特集)
- Extraction of Trap States at the Oxide-Silicon Interface and Grain Boundary for Polycrystalline Silicon Thin-Film Transistors : Semiconductors
- Current Density Enhancement at Active Layer Edges in Polycrystalline Silicon Thin-Film Transistors : Semiconductors
- Device Simulation of Carrier Transport through Grain Boundaries in Lightly Doped Polysilicon Films and Dependence on Dopant Density : Semiconductors
- Current Paths over Grain Boundaries in Polycrystalline Silicon Films : Semiconductors
- Determination of the Anisotropic Refractive Indices of Twisted Nematic Liquid Crystals by Means of Renormalized Transmission Ellipsometry : Instrumentation, Measurement, and Fabrication Technology
- Determination of Film Thickness and Anisotropy of the Refractive Indices in 4-octyl-4'-cyanobiphenyl Liquid Crystalline Free-Standing Films
- Pulse-Width Modulation with Current Uniformization for TFT-OLEDs(Electronic Displays)
- Device Simulation of grain Boundaries with Oxide-Silicon Interface Roughness in Laser-Crystallized Polycrystalline Silicon Thin-Film Transistors
- 24.4:Investigation of Hot Carrier Degradation Due to AC Stress in Low Temperature Poly-Si TFTs(発表概要)(Report on 2000 SID International Symposium)
- Time-Ratio Grayscale and Hopping Scan with Current Uniformization for Thin-Film Transistor Driven Organic Light-Emitting Diode Displays (Special Issue: Active-Matrix Liquid-Crystal Displays--TFT Technologies and Related Materials)
- Determination of Director Profile of Twisted Nematic Liquid Crystal Cell with Tilted Surface Alignment by Renormalized Transmission Ellipsometry
- Surface Azimuthal Anchoring Energy between the Grating Surface and Nematic Liquid Crystal Layer Studied by Finite Element Method
- Measurement of Genuine Azimuthal Anchoring Energy in Consideration of Liquid Crystal Molecular Adsorption on Alignment Film
- Quantitative Analysis of Nematic Director Reorientation Dynamics Studied by Time-Resolved Spectroscopic Ellipsometry
- Dynamics of Surface-Stabilized Ferroelectric Liquid Crystals at the Alignment Layer Surface Studied by Total-Reflection Ellipsometry : Structure and Mechanical and Thermal Properties of Condensed Matter
- Analysis of Totally Reflected Light from Liquid Crystal Cell using Renormalized Ellipsometry
- Test Structure for the Evaluation of Si Substrates (Special Issue on Microelectronic Test Structure)
- Optical Properties of 4-Octyl-4'-Cyanobiphenyl Liquid-Crystalline Free-Standing Films
- Transmission Ellipsometry of 4-Octyl-4'-Cyanobiphenyl Liquid-Crystalline Free-Standing Films