Shimoda Tatsuya | Technology Platform Research Center Seiko Epson Corp.
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概要
関連著者
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corp.
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INOUE Satoshi
Technology Platform Research Center, Seiko Epson Cooperation
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SHIMODA Tatsuya
Technology Platform Research Center, Seiko Epson Cooperation
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SHIMODA Tatsuya
Seiko Epson Corporation
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Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
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Shimoda T
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corporation
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Kimura Mutsumi
Department of Chemistry, Graduate School of Natural Science and Technology, Okayama University
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井上 聡
セイコーエプソン株式会社フロンティアデバイス研究所
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下田 達也
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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KIMURA Mutsumi
Department of Electronics and Informatics, Ryukoku University
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INOUE Satoshi
Seiko Epson Corporation
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ABE Daisuke
Technology Platform Research Center, Seiko Epson Cooperation
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HIGUCHI Takamitsu
Technology Platform Research Center, SEIKO EPSON Corporation
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IWASHITA Setsuya
Technology Platform Research Center, SEIKO EPSON Corporation
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Inoue S
Frontier Device Research Center Seiko Epson Corporation
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Kimura Mutsumi
Technology Platform Research Center Seiko Epson Corporation
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Inoue S
Seiko Epson Corporation
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Izumi S
Division Of Oral Cytology And Cell Biology Nagasaki University Graduate School Of Biomedical Science
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Kijima Takeshi
Technology Platform Research Center Seiko Epson Corporation
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Iwashita Setsuya
Technology Platform Research Center Seiko Epson Corporation
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下田 達也
Seiko Epson Corporation
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Higuchi T
東理大理
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木村 睦
龍谷大学電子情報学科
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小池 淳一
東北大
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樋口 透
東理大理
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小池 淳一
東北大工
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木村 睦
Department Of Electronics And Informatics Ryukoku University
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KIMURA Mutsumi
Ryukoku University
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ISHIHARA Ryoichi
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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HIROSHIMA Yasushi
Technology Platform Research Center, Seiko Epson Cooperation
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METSELAAR Wim
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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BEENAKKER Kees
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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KIMURA Mutsumi
Technology Platform Research Center, Seiko Epson Corporation
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Abe Daisuke
Frontier Device Research Center Seiko Epson Corporation
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Kimura Mutsumi
Ryukoku University:innovative Materials And Processing Research Center
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KIJIMA Takeshi
Technology Platform Research Center, SEIKO EPSON CORPORATION
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AOYAMA Taku
Technology Platform Research Center, SEIKO EPSON CORPORATION
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MIYAZAWA Hiromu
Technology Platform Research Center, SEIKO EPSON CORPORATION
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HAMADA Yasuaki
Technology Platform Research Center, SEIKO EPSON CORPORATION
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CHEN Yuxi
Department of Materials Science, Graduate School of Engineering, Tohoku University
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Ishida Masaya
Technology Platform Research Center Seiko Epson Corporation
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Chen Yuxi
Department Of Materials Science Graduate School Of Engineering Tohoku University
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Koikei Junichi
Department Of Materials Science Graduate School Of Engineering Tohoku University
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Koike Junichi
Department Of Materials Science Graduate School Of Engineering Tohokuuniversity
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Karaki Nobuo
Technology Platform Research Center, Seiko Epson Corp.
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Karaki Nobuo
Technology Platform Research Center Seiko Epson Corp.
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Shimoda Tatsuya[
Base Technology Research Center Seiko Epson Corporation
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Kimura M
Department Of Electrical Engineering Kure National College Of Technology
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Chen Y
Department Of Electronic Science And Engineering Kyoto University
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Aoyama Taku
Technology Platform Research Center Seiko Epson Corporation
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Kijima T
Functional Devices Laboratories Sharp Corporation
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Chen Yuxi
Department Of Electronic Science And Engineering Kyoto University
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Chen Y
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Karaki Nobuo
Frontier Device Research Center Seiko Epson Corporation
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Kimura Mutsumi
Ryukoku Univ. Otsu‐shi Jpn
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Okuyama Tomoyuki
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Nagano 399-0293, Japan
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KOIKE Junichi
Department of Materials Science, Tohoku University
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Higuchi T
Department Of Applied Physics Tokyo University Of Science
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HARADA Kiyoshi
Department of Electronics and Informatics, Ryukoku University
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YASUHARA Tohru
Department of Electronics and Informatics, Ryukoku University
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RANA Vikas
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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TAM Simon
Cambridge Research Laboratory of Epson
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Shimoda T
Seiko Epson Corp. Nagano‐ken Jpn
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Shimoda Tatsuya
Seiko Epson Corporation Technology Platform Research Center
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Metselaar Wim
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
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Yasuhara Tohru
Department Of Electronics And Informatics Ryukoku University
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OHASHI Koji
Technology Platform Research Center, SEIKO EPSON CORPORATION
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NAKAYAMA Masao
Technology Platform Research Center, SEIKO EPSON CORPORATION
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NATORI Eiji
Technology Platform Research Center, SEIKO EPSON CORPORATION
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Beenakker Kees
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
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KOIKEI Junichi
Department of Materials Science, Graduate School of Engineering, Tohoku University
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ISHIDA Masaya
Technology Platform Research Center, SEIKO EPSON Corporation
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ISHIDAI Masaya
Technology Platform Research Center, SEIKO EPSON Corporation
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Koike Junichi
Department Of Materials Science Tohoku University
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Hara Yuji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Okayama University
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Rana Vikas
Delft Institute Of Microelectronics And Submicron Technology (dimes) Delft University Of Technology
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Harada Kiyoshi
Department Of Electronics And Informatics Ryukoku University
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OHSHIMA Hiroyuki
Displays Operations Division, Seiko Epson Corporation
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Kaneko Takeo
Technology Platform Research Center Seiko Epson Corporation
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Takaya Mitsuru
Technology Platform Research Center Seiko Epson Corporation
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Nishida Tetsuo
Technology Platform Research Center Seiko Epson Corporation
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Takenaka Satoshi
Displays Operations Division Seiko Epson Corporation
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Ohashi Koji
Technology Platform Research Center Seiko Epson Corporation
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Natori Eiji
Seiko Epson Corporation Technology Platform Research Center
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Moriya Soichi
Technology Platform Research Center Seiko-epson Corporation
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Nakayama Masao
Technology Platform Research Center Seiko Epson Corporation
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Shimoda Tatsuya
Technology Platform Research Center Seiko-epson Corporation
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Kawase Takeo
Technology Platform Research Center Seiko-epson Corporation
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NEWSOME Christopher
Cambridge Research Laboratory of Epson
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TSUNEKAWA Yoshifumi
TFT Design Technology Department, SEIKO EPSON Corporation
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Jiroku Hiroaki
Technology Platform Research Center Seiko Epson Corporation
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Takakuwa Atsushi
Technology Platform Research Center Seiko Epson Corporation
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Miyasaka Mitsutoshi
Technology Platform Research Center Seiko Epson Corporation
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Ishihara R
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
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Miyazawa H
Base Technology Research Center Seiko Epson Corporation
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Hamada Yasuaki
Seiko Epson Corporation Technology Platform Research Center
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Ohshima Hiroyuki
Displays Operations Division Seiko Epson Corporation
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Hiroshima Y
Technology Platform Research Center Seiko Epson Cooperation
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Abe Daisuke
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan
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Kato Masakazu
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu 520-2194, Japan
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Hara Hiroyuki
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Nagano 399-0293, Japan
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Takenaka Satoshi
Displays Operations Division, Seiko Epson Corporation, Fujimi 281, Fujimi-machi, Suwa-gun, Nagano 392-0293, Japan
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Beenakker Kees
Delft University of Technology, Delft Institute of Microelectronics and Submicron Technology (DIMES), Laboratory of Electronic Components, Technology and Materials (ECTM), Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
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Shima Takehiro
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu 520-2194, Japan
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Utsunomiya Sumio
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Nagano 399-0293, Japan
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Miyazawa Wakao
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Nagano 399-0293, Japan
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Kimura Mutsumi
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu 520-2194, Japan
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He Ming
Delft University of Technology, Delft Institute of Microelectronics and Submicron Technology (DIMES), Laboratory of Electronic Components, Technology and Materials (ECTM), Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
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Ishida Masaya
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
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Hiroshima Yasushi
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan
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Kijima Takeshi
Technology Platform Research Center, SEIKO EPSON CORPORATION, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
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Tsunekawa Yoshifumi
TFT Design Technology Department, SEIKO EPSON Corporation, 1010 Fujimi, Suwa-gun, Nagano 399-0295, Japan
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Miyazawa Hiromu
Technology Platform Research Center, SEIKO EPSON CORPORATION, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
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Nishida Tetsuo
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi-machi Suwa-gun, Nagano 399-0293, Japan
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Hara Yuji
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu 520-2194, Japan
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Miyasaka Mitsutoshi
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Suwa-gun, Nagano 399-0293, Japan
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Takakuwa Atsushi
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
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Metselaar Wim
Delft University of Technology, Delft Institute of Microelectronics and Submicron Technology (DIMES), Laboratory of Electronic Components, Technology and Materials (ECTM), Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
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Jiroku Hiroaki
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Suwa-gun, Nagano 399-0293, Japan
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Shimoda Tatsuya
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Nagano 399-0293, Japan
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Shimoda Tatsuya
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan
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Shimoda Tatsuya
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
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Shimoda Tatsuya
Technology Platform Research Center, Seiko Epson Corporation, Fujimi 281, Fujimi-machi, Suwa-gun, Nagano 392-0293, Japan
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Takaya Mitsuru
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi-machi Suwa-gun, Nagano 399-0293, Japan
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Kimura Mutsumi
Technology Platform Research Center, Seiko Epson Corporation, Fujimi 281, Fujimi-machi, Suwa-gun, Nagano 392-0293, Japan
著作論文
- High Performance P-Channel Single-Crystalline Si TFTs Fabricated Inside a Location-Controlled Grain by μ-Czochralski Process(Electronic Displays)
- 表側と裏側の絶縁膜界面にトラップ準位をもつポリシリコン薄膜トランジスタのデバイスシミュレーション(ディスプレイ-IDW'03関連-)
- Numerical Model of Thin-Film Transistors for Circuit Simulation Using Spline Interpolation with Transformation by y=x + log(x)(Regular Section)
- Novel Si Codoped Pb(Zr, Ti, Nb)O_3 Thin Film for High-Density Ferroelectric Random Access Memory
- Fabrication of KNbO_3 Epitaxial Thin Films on Sapphire Substrates by Pulsed Laser Deposition
- Fabrication of Pseudocubic SrRuO_3 (100) Epitaxial Thin Films on Si by Pulsed Laser Deposition : Surfaces, Interfaces, and Films
- Microstructural Investigation of Pulsed-Laser-Deposited SrRuO_3 Films on Si with SrO Buffer Layers : Semiconductors
- Analysis of Degradation Phenomenon Caused by Self-Heating in Low-Temperature-Processed Polycrystalline Silicon Thin Film Transistors
- Invited Asynchronous Architecture and Its Impact on Low-Power TFT CPUs (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Invited Asynchronous Architecture and Its Impact on Low-Power TFT CPUs (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Inkjet Printing of Polymeric Field-Effect Transistors and Its Applications
- Analysis and Classification of Degradation Phenomena in Polycrystalline-Silicon Thin Film Transistors Fabricated by a Low-Temperature Process Using Emission Light Microscopy
- Extraction of Trap Densities at Front and Back Interfaces in Thin-Film Transistors
- Evaluation of Imprint Property of (111)-Highly Oriented Lead Zirconate Titanate (PZT)-Base Ferroelectric Material
- High-Performance Polycrystalline Silicon Thin-Film Transistors with Low Trap Density at the Gate-SiO2/Si Interface Fabricated by Low-Temperature Process
- Time-Ratio Grayscale and Hopping Scan with Current Uniformization for Thin-Film Transistor Driven Organic Light-Emitting Diode Displays
- Artificial Retina Using Thin-Film Photodiodes and Thin-Film Transistors
- Effects of Capping Layer on Grain Growth with $\mu$-Czochralski Process during Excimer Laser Crystallization
- Study of Degradation Phenomenon Due to a Combination of Contamination and Self-Heating in Poly-Si Thin Film Transistors Fabricated by a Low-Temperature Process
- High-Performance Polycrystalline Silicon Thin-Film Transistors Fabricated by High-Temperature Process with Excimer Laser Annealing
- GaInNAs/GaAs Multiple-Quantum-Well Grown by Metalorganic Chemical Vapor Deposition Using Nitrogen Carrier Gas
- Micropatterning of SrBi2Ta2O9 Ferroelectric Thin Films Using a Selective Deposition Technique Combined with Patterned Self-Assembled Monolayers and Liquid-Source Misted Chemical Deposition
- Analysis and Classification of Degradation Phenomena in Polycrystalline-Silicon Thin Film Transistors Fabricated by a Low-Temperature Process Using Emission Light Microscopy