Beenakker Kees | Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
スポンサーリンク
概要
- BEENAKKER Keesの詳細を見る
- 同名の論文著者
- Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectronの論文著者
関連著者
-
Metselaar Wim
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Beenakker Kees
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Ishihara R
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
HE Ming
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectr
-
Van Andel
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Schellevis Hugo
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Ishihara Ryoichi
Laboratory Of Electronic Components And Materials (ectm) Delft Institute Of Microelectronics And Sub
-
井上 聡
セイコーエプソン株式会社フロンティアデバイス研究所
-
下田 達也
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
-
INOUE Satoshi
Seiko Epson Corporation
-
SHIMODA Tatsuya
Seiko Epson Corporation
-
RANA Vikas
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
ISHIHARA Ryoichi
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
HIROSHIMA Yasushi
Technology Platform Research Center, Seiko Epson Cooperation
-
ABE Daisuke
Technology Platform Research Center, Seiko Epson Cooperation
-
INOUE Satoshi
Technology Platform Research Center, Seiko Epson Cooperation
-
SHIMODA Tatsuya
Technology Platform Research Center, Seiko Epson Cooperation
-
METSELAAR Wim
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
BEENAKKER Kees
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
Abe Daisuke
Frontier Device Research Center Seiko Epson Corporation
-
Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
-
Rana Vikas
Delft Institute Of Microelectronics And Submicron Technology (dimes) Delft University Of Technology
-
Inoue S
Frontier Device Research Center Seiko Epson Corporation
-
Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corp.
-
ISHIHARA Ryoichi
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectr
-
NEIHOF Ellen
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectr
-
VAN ANDEL
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectr
-
SCHELLEVIS Hugo
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectr
-
ISHIHARA Ryoichi
Faculty of Electrical Engineering, Mathematics and Computer Science, Delft University of Technology
-
GLAZER Arie
Orbotech Corporation
-
RAAB Yoel
Orbotech Corporation
-
RUSIAN Peter
Orbotech Corporation
-
DORFAN Mannie
Orbotech Corporation
-
LAVI Benzi
Orbotech Corporation
-
LEIZERSON Ilya
Orbotech Corporation
-
KISHINEVSKY Albert
Orbotech Corporation
-
VAN ANDEL
Orbotech Corporation
-
CAO Xin
Orbotech Corporation
-
METSELAAR Wim
Orbotech Corporation
-
BEENAKKER Kees
Orbotech Corporation
-
STOLYAROVA Sara
Department of Electrical Engineering, Technion-Israel Institute of Technology
-
NEMIROVSKY Yael
Department of Electrical Engineering, Technion-Israel Institute of Technology
-
Inoue S
Seiko Epson Corporation
-
Izumi S
Division Of Oral Cytology And Cell Biology Nagasaki University Graduate School Of Biomedical Science
-
Neihof Ellen
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Stolyarova Sara
Department Of Electrical Engineering Technion-israel Institute Of Technology
-
下田 達也
Seiko Epson Corporation
-
Hiroshima Y
Technology Platform Research Center Seiko Epson Cooperation
-
Nemirovsky Yael
Department Of Electrical Engineering Technion-israel Institute Of Technology
-
Wu Meng-Yue
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands
-
Beenakker Kees
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P.O. Box 5053, 2628 CT Delft, The Netherlands
-
Beenakker Kees
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
-
Tao Chen
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
-
Ishihara Ryoichi
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P.O. Box 5053, 2628 CT Delft, The Netherlands
-
Ishihara Ryoichi
Faculty of Electrical Engineering, Mathematics and Computer Science (EEMCS), Department of Microelectronics and Computer Engineering (ME&CE), Delft Institute of Microsystems and Nanoelectronics (DIMES), Delft University of Technology, Feldmannweg 17,
-
Ishihara Ryoichi
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
-
He Ming
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P.O. Box 5053, 2628 CT Delft, The Netherlands
-
Schellevis Hugo
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P.O. Box 5053, 2628 CT Delft, The Netherlands
-
Neihof Ellen
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P.O. Box 5053, 2628 CT Delft, The Netherlands
-
Metselaar Wim
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P.O. Box 5053, 2628 CT Delft, The Netherlands
-
Metselaar Wim
Laboratory of Electronic Components, Technology and Materials (ECTM), Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology, Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
著作論文
- High Performance P-Channel Single-Crystalline Si TFTs Fabricated Inside a Location-Controlled Grain by μ-Czochralski Process(Electronic Displays)
- Large Polycrystalline Silicon Grains Prepared by Excimer Laser Crystallization of Sputtered Amorphous Silicon Film with Process Temperature at 100℃
- A Novel Selected Area Laser Assisted (SALA) System for Crystallization and Doping Processes in Low-Temperature Poly-Si Thin-Film Transistors(Electronic Displays)
- Large Polycrystalline Silicon Grains Prepared by Excimer Laser Crystallization of Sputtered Amorphous Silicon Film with Process Temperature at 100 °C
- Location and Crystallographic Orientation Control of Si Grains through Combined Metal Induced Lateral Crystalization and μ-Czochralski Process