ABE Daisuke | Technology Platform Research Center, Seiko Epson Cooperation
スポンサーリンク
概要
関連著者
-
ABE Daisuke
Technology Platform Research Center, Seiko Epson Cooperation
-
井上 聡
セイコーエプソン株式会社フロンティアデバイス研究所
-
下田 達也
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
-
INOUE Satoshi
Seiko Epson Corporation
-
SHIMODA Tatsuya
Seiko Epson Corporation
-
INOUE Satoshi
Technology Platform Research Center, Seiko Epson Cooperation
-
Abe Daisuke
Frontier Device Research Center Seiko Epson Corporation
-
Inoue S
Frontier Device Research Center Seiko Epson Corporation
-
Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corp.
-
Inoue S
Seiko Epson Corporation
-
Izumi S
Division Of Oral Cytology And Cell Biology Nagasaki University Graduate School Of Biomedical Science
-
下田 達也
Seiko Epson Corporation
-
HIROSHIMA Yasushi
Technology Platform Research Center, Seiko Epson Cooperation
-
SHIMODA Tatsuya
Technology Platform Research Center, Seiko Epson Cooperation
-
Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
-
Hiroshima Y
Technology Platform Research Center Seiko Epson Cooperation
-
木村 睦
龍谷大学電子情報学科
-
木村 睦
Department Of Electronics And Informatics Ryukoku University
-
HARADA Kiyoshi
Department of Electronics and Informatics, Ryukoku University
-
YASUHARA Tohru
Department of Electronics and Informatics, Ryukoku University
-
KIMURA Mutsumi
Department of Electronics and Informatics, Ryukoku University
-
KIMURA Mutsumi
Ryukoku University
-
RANA Vikas
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
ISHIHARA Ryoichi
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
METSELAAR Wim
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
BEENAKKER Kees
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
-
ABE Daisuke
Seiko Epson Corporation, Technology Platform Research Center
-
HIGASHI Seiichiro
Seiko Epson Corporation, Technology Platform Research Center
-
Metselaar Wim
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Kimura Mutsumi
Ryukoku University:innovative Materials And Processing Research Center
-
Yasuhara Tohru
Department Of Electronics And Informatics Ryukoku University
-
Beenakker Kees
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Rana Vikas
Delft Institute Of Microelectronics And Submicron Technology (dimes) Delft University Of Technology
-
Harada Kiyoshi
Department Of Electronics And Informatics Ryukoku University
-
HlGASHI Seiichiro
Seiko Epson Corporation, Technology Platform Research Center
-
HIROSHIMA Yasushi
Seiko Epson Corporation, Technology Platform Research Center
-
MlYASHlTA Kazuyuki
Seiko Epson Corporation, Technology Platform Research Center
-
KAWAMURA Takahiro
Seiko Epson Corporation, Technology Platform Research Center
-
Shimoda Tatsuya[
Base Technology Research Center Seiko Epson Corporation
-
Kimura M
Department Of Electrical Engineering Kure National College Of Technology
-
Kawamura Takahiro
Seiko Epson Corporation Technology Platform Research Center
-
Ishihara R
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
-
Kimura Mutsumi
Ryukoku Univ. Otsu‐shi Jpn
-
Higashi S
Seiko Epson Corporation Technology Platform Research Center
-
Higashi Seiichiro
Seiko Epson Corporation
-
Mlyashlta Kazuyuki
Seiko Epson Corporation Technology Platform Research Center
-
Abe Daisuke
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan
-
Kimura Mutsumi
Department of Chemistry, Graduate School of Natural Science and Technology, Okayama University
-
Shimoda Tatsuya
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan
著作論文
- High Performance P-Channel Single-Crystalline Si TFTs Fabricated Inside a Location-Controlled Grain by μ-Czochralski Process(Electronic Displays)
- 表側と裏側の絶縁膜界面にトラップ準位をもつポリシリコン薄膜トランジスタのデバイスシミュレーション(ディスプレイ-IDW'03関連-)
- High-Quality SiO_2/Si Interface Formation and Its Application to Fabrication of Low-Temperature-Processed Polycrystalline Si Thin-Film Transistor(Semiconductors)
- High-Performance Polycrystalline Silicon Thin-Film Transistors with Low Trap Density at the Gate-SiO2/Si Interface Fabricated by Low-Temperature Process