HIROSHIMA Yasushi | Technology Platform Research Center, Seiko Epson Cooperation
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概要
関連著者
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HIROSHIMA Yasushi
Technology Platform Research Center, Seiko Epson Cooperation
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Hiroshima Y
Technology Platform Research Center Seiko Epson Cooperation
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井上 聡
セイコーエプソン株式会社フロンティアデバイス研究所
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下田 達也
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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INOUE Satoshi
Seiko Epson Corporation
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SHIMODA Tatsuya
Seiko Epson Corporation
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ISHIHARA Ryoichi
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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ABE Daisuke
Technology Platform Research Center, Seiko Epson Cooperation
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INOUE Satoshi
Technology Platform Research Center, Seiko Epson Cooperation
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METSELAAR Wim
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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BEENAKKER Kees
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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Abe Daisuke
Frontier Device Research Center Seiko Epson Corporation
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Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
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Ishiguro T
Kyoto Univ. Kyoto
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Inoue S
Frontier Device Research Center Seiko Epson Corporation
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corp.
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Inoue S
Seiko Epson Corporation
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Izumi S
Division Of Oral Cytology And Cell Biology Nagasaki University Graduate School Of Biomedical Science
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Ishiguro T
Department Of Physics Graduate School Of Science Kyoto University:crest Japan Science And Technology
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ISHIGURO Takashi
Department of Electrical Engineering, Nagaoka University of Technology
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HIROSHIMA Yasushi
Applied Laser Engineering Research Institute
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ESAKI Kotaro
Department of Electrical Engineering, Nagaoka University of Technology
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Ishiguro T
Nagaoka Univ. Technol. Nagaoka Jpn
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Esaki Kotaro
Department Of Electrical Engineering Nagaoka University Of Technology
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下田 達也
Seiko Epson Corporation
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ISHIGAURO Takehiko
Electrotechnical Laboratory
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Ishiguro Takashi
Department Of 2nd Physiology Showa University School Of Medicine
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RANA Vikas
Delft Institute of Microelectronics and Submicron Technology (DIMES), Delft University of Technology
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SHIMODA Tatsuya
Technology Platform Research Center, Seiko Epson Cooperation
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ABE Daisuke
Seiko Epson Corporation, Technology Platform Research Center
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HIGASHI Seiichiro
Seiko Epson Corporation, Technology Platform Research Center
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Metselaar Wim
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
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Beenakker Kees
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
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Rana Vikas
Delft Institute Of Microelectronics And Submicron Technology (dimes) Delft University Of Technology
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HlGASHI Seiichiro
Seiko Epson Corporation, Technology Platform Research Center
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HIROSHIMA Yasushi
Seiko Epson Corporation, Technology Platform Research Center
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MlYASHlTA Kazuyuki
Seiko Epson Corporation, Technology Platform Research Center
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KAWAMURA Takahiro
Seiko Epson Corporation, Technology Platform Research Center
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Kawamura Takahiro
Seiko Epson Corporation Technology Platform Research Center
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Ishihara R
Laboratory Of Electronic Components Technology And Materials (ectm) Delft Institute Of Microelectron
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Higashi S
Seiko Epson Corporation Technology Platform Research Center
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Higashi Seiichiro
Seiko Epson Corporation
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Mlyashlta Kazuyuki
Seiko Epson Corporation Technology Platform Research Center
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Beenakker Kees
Delft University of Technology, Delft Institute of Microelectronics and Submicron Technology (DIMES), Laboratory of Electronic Components, Technology and Materials (ECTM), Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
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He Ming
Delft University of Technology, Delft Institute of Microelectronics and Submicron Technology (DIMES), Laboratory of Electronic Components, Technology and Materials (ECTM), Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
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Hiroshima Yasushi
Technology Platform Research Center, Seiko Epson Corporation, 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan
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Metselaar Wim
Delft University of Technology, Delft Institute of Microelectronics and Submicron Technology (DIMES), Laboratory of Electronic Components, Technology and Materials (ECTM), Feldmannweg 17, P. O. Box 5053, 2600 GB Delft, The Netherlands
著作論文
- High Performance P-Channel Single-Crystalline Si TFTs Fabricated Inside a Location-Controlled Grain by μ-Czochralski Process(Electronic Displays)
- High-Quality SiO_2/Si Interface Formation and Its Application to Fabrication of Low-Temperature-Processed Polycrystalline Si Thin-Film Transistor(Semiconductors)
- Applications of Pulsed Excimer Laser Deposition with a Frozen Nitrogen Target to Deposition of NbN and BN Films
- Formation of a Frozen Nitrogen Target and Characterization for the Application of Pulsed Laser Deposition
- Effects of Capping Layer on Grain Growth with $\mu$-Czochralski Process during Excimer Laser Crystallization