Ishida Masaya | Technology Platform Research Center Seiko Epson Corporation
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概要
関連著者
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Ishida Masaya
Technology Platform Research Center Seiko Epson Corporation
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corp.
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小池 淳一
東北大
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樋口 透
東理大理
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小池 淳一
東北大工
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SHIMODA Tatsuya
Seiko Epson Corporation
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SHIMODA Tatsuya
Technology Platform Research Center, Seiko Epson Cooperation
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Shimoda T
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corporation
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Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
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HIGUCHI Takamitsu
Technology Platform Research Center, SEIKO EPSON Corporation
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IWASHITA Setsuya
Technology Platform Research Center, SEIKO EPSON Corporation
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CHEN Yuxi
Department of Materials Science, Graduate School of Engineering, Tohoku University
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KOIKEI Junichi
Department of Materials Science, Graduate School of Engineering, Tohoku University
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ISHIDA Masaya
Technology Platform Research Center, SEIKO EPSON Corporation
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Chen Yuxi
Department Of Materials Science Graduate School Of Engineering Tohoku University
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Koikei Junichi
Department Of Materials Science Graduate School Of Engineering Tohoku University
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Koike Junichi
Department Of Materials Science Graduate School Of Engineering Tohokuuniversity
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Chen Y
Department Of Electronic Science And Engineering Kyoto University
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Takakuwa Atsushi
Technology Platform Research Center Seiko Epson Corporation
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Chen Yuxi
Department Of Electronic Science And Engineering Kyoto University
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Chen Y
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Iwashita Setsuya
Technology Platform Research Center Seiko Epson Corporation
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Higuchi T
東理大理
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Ishida Masaya
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
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Takakuwa Atsushi
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
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Shimoda Tatsuya
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan
著作論文
- Fabrication of Pseudocubic SrRuO_3 (100) Epitaxial Thin Films on Si by Pulsed Laser Deposition : Surfaces, Interfaces, and Films
- Micropatterning of SrBi2Ta2O9 Ferroelectric Thin Films Using a Selective Deposition Technique Combined with Patterned Self-Assembled Monolayers and Liquid-Source Misted Chemical Deposition