KIJIMA Takeshi | Technology Platform Research Center, SEIKO EPSON CORPORATION
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概要
関連著者
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KIJIMA Takeshi
Technology Platform Research Center, SEIKO EPSON CORPORATION
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Kijima T
Functional Devices Laboratories Sharp Corporation
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Kijima Takeshi
Technology Platform Research Center Seiko Epson Corporation
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Kijima Takeshi
Functional Devices Laboratories Sharp Corporaton
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AOYAMA Taku
Technology Platform Research Center, SEIKO EPSON CORPORATION
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Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
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Aoyama Taku
Technology Platform Research Center Seiko Epson Corporation
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SHIMODA Tatsuya
Technology Platform Research Center, Seiko Epson Cooperation
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Shimoda Tatsuya
Seiko Epson Corporation Technology Platform Research Center
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HAMADA Yasuaki
Technology Platform Research Center, SEIKO EPSON CORPORATION
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NATORI Eiji
Technology Platform Research Center, SEIKO EPSON CORPORATION
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corp.
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Natori Eiji
Seiko Epson Corporation Technology Platform Research Center
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Kijima Takeshi
Functional Devices Laboratories Sharp Corporation
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USHIKUBO Maho
Functional Devices Laboratories, Sharp Corporation
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MATSUNAGA Hironori
Functional Devices Laboratories, Sharp Corporation
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Ushikubo M
Functional Devices Laboratories Sharp Corporation
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Ushikubo Maho
Functional Devices Laboratories Sharp Corporation
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Matsunaga H
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Matsunaga Hironori
Functional Devices Laboratories Sharp Corporation
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Hamada Yasuaki
Seiko Epson Corporation Technology Platform Research Center
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Higuchi T
Department Of Applied Physics Tokyo University Of Science
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SHIMODA Tatsuya
Seiko Epson Corporation
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Shimoda T
Center For Nano Materials And Technology Japan Advanced Institute Of Science And Technology
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Shimoda Tatsuya
Technology Platform Research Center Seiko Epson Corporation
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MIYAZAWA Hiromu
Technology Platform Research Center, SEIKO EPSON CORPORATION
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OHASHI Koji
Technology Platform Research Center, SEIKO EPSON CORPORATION
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NAKAYAMA Masao
Technology Platform Research Center, SEIKO EPSON CORPORATION
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KIJIMA Takeshi
SEIKO EPSON Corporation, Technology Platform Research Center
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HAMADA Yasuaki
SEIKO EPSON Corporation, Technology Platform Research Center
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AOYAMA Taku
SEIKO EPSON Corporation, Technology Platform Research Center
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NATORI Eiji
SEIKO EPSON Corporation, Technology Platform Research Center
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HIGUCHI Takamitsu
Technology Platform Research Center, SEIKO EPSON Corporation
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IWASHITA Setsuya
Technology Platform Research Center, SEIKO EPSON Corporation
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ISHIWARA Hiroshi
Frontier Collaborative Research Center, Tokyo Institute of Technology
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Ishiwara Hiroshi
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Ishiwara Hiroshi
Department Of Applied Electronics Tokyo Institute Of Technology
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Ishiwara Hiroshi
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering
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Ishiwara Hiroshi
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Ishiwara Hiroshi
Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Ishiwara Hiroshi
Precision & Intelligence Laboratory Tokyo Institute Of Technology:frontier Collaborative Researc
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Ohashi Koji
Technology Platform Research Center Seiko Epson Corporation
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Ishiwara H
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering
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Nakayama Masao
Technology Platform Research Center Seiko Epson Corporation
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Kijima Takeshi
Frontier Collaborative Research Center Tokyo Institute Of Technology
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Ishiwara Hiroshi
Frontier Collaborative Research Center Tokyo Insitute Of Technology
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Iwashita Setsuya
Technology Platform Research Center Seiko Epson Corporation
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FUJISAKI Yoshihisa
Frontier Collaborative Research Center, Tokyo Institute of Technology
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Miyazawa H
Base Technology Research Center Seiko Epson Corporation
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Fujisaki Y
R&d Association For Future Electron Devices
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Higuchi T
東理大理
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Fujisaki Yoshihisa
R&D Association for Future Electron Devices
著作論文
- Novel Si Codoped Pb(Zr, Ti, Nb)O_3 Thin Film for High-Density Ferroelectric Random Access Memory
- Preparation of Novel PZTN Thin Film Co-doped Si
- Fabrication of KNbO_3 Epitaxial Thin Films on Sapphire Substrates by Pulsed Laser Deposition
- New Low-Temperature Processing of Metalorganic Chemical Vapor Deposition-Bi_4Ti_3O_ Thin Films Using BiO_x Buffer Layer
- New Low Temperature Processing of MOCVD-Bi_4Ti_3O_ Thin Films Using BiO_x Buffer Layer
- Fabrication and Characterization of Pt/(Bi, La)_4Ti_3O_/Si_3N_4/Si MFIS Structure for FET-Type Ferroelectric Memory Applications