Matsunaga Hironori | Functional Devices Laboratories Sharp Corporation
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概要
関連著者
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Matsunaga Hironori
Functional Devices Laboratories Sharp Corporation
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Kijima Takeshi
Functional Devices Laboratories Sharp Corporation
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MATSUNAGA Hironori
Functional Devices Laboratories, Sharp Corporation
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USHIKUBO Maho
Functional Devices Laboratories, Sharp Corporation
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Ushikubo Maho
Functional Devices Laboratories Sharp Corporation
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Kijima Takeshi
Functional Devices Laboratories Sharp Corporaton
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KIJIMA Takeshi
Technology Platform Research Center, SEIKO EPSON CORPORATION
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Kijima T
Functional Devices Laboratories Sharp Corporation
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Kijima Takeshi
Technology Platform Research Center Seiko Epson Corporation
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Ushikubo M
Functional Devices Laboratories Sharp Corporation
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Matsunaga H
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Ito Yasuyuki
Functional Devices Laboratories Sharp Corporation
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OGI Katsumi
Mitsubishi Materials Corporation, Central Research Institute
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OGI Katsumi
Central Research Institute, Mitsubishi Materials Corporaltion
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Ogi K
Mitsubishi Materials Corporation Central Research Institute
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Koba Masayoshi
Functional Devices Laboratory Sharp Corporation
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Kijima T
R&d Association For Future Electron Devices
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Yokoyama Seiichi
Functional Devices Laboratories, SHARP Corporation
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YONEZAWA Tadashi
Central Research Institute, Mitsubishi Materials Corporation
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Yokoyama Seiichi
Functional Devices Laboratories Sharp Corporation
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ATSUKI Tsutomu
Central Research Institute, Mitsubishi Material Corporation
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Atsuki T
Mitsubishi Materials Corporation Central Research Institute
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Atsuki Tsutomu
Central Research Institute Mitsubishi Materials Corporation
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SATOH Sakiko
Functional Devices Laboratory, SHARP Corporation
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Yonezawa T
Mitsubishi Materials Corp. Omiya Jpn
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Sato S
Akita Univ. Akita Jpn
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Matsunaga H
Assoc. Of Super-advanced Electronics Technol. (aset) Kanagawa Jpn
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Matsunaga Hironori
Functional Devices Laboratories Sharp Corporaton
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Yonezawa Tadashi
Central Research Institute Mitsubishi Materials Corporation
著作論文
- New Low Temperature Processing of Sol-Gel SrBi_2Ta_2O_9 Thin Films
- New Low-Temperature Processing of Metalorganic Chemical Vapor Deposition-Bi_4Ti_3O_ Thin Films Using BiO_x Buffer Layer
- New Low Temperature Processing of MOCVD-Bi_4Ti_3O_ Thin Films Using BiO_x Buffer Layer
- Ultra-Thin Fatigue-Free Bi_4Ti_3O_ Films for Nonvolatile Ferroelectric Memories
- Preparation of Bi_4Ti_3O_ Thin Films by MOCVD Method and Electrical Properties of MFIS Structure
- Preparation of Bi_4Ti_3O_ Thin Films by MOCVD Method and Electrical Properties of Metal/Ferroelectric/Insulator/Semiconductor Structure
- Preparation of Bi_4Ti_3O_ Thin Film on Si(100) Substrate Using Bi_2SiO_5 Buffer Layer and Its Electric Characterization