Structural Properties of Nickel Metal-Induced Laterally Crystallized Silicon Films and Their Improvement Using Excimer Laser Annealing
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-05-15
著者
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Shimoda Tatsuya
Seiko Epson Corporation Technology Platform Research Center
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Shimoda Tatsuya
Seiko Epson Corp. Nagano Jpn
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Asano Tanemasa
Kyushu Univ. Fukuoka‐city Jpn
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MIYASAKA Mitsutoshi
Seiko Epson Corporation, Technology Platform Research Center
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MAKIHIRA Kenji
Kyushu Institute of Technology, Center for Microelectronics Systems
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PECZ Bela
Research Institute For Technical Physics and Material Science
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STOEMENOS John
Aristotle University of Thessaloniki, Department of Physics
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Asano Tanemasa
Kyushu Institute Of Technology Center For Microelectronics Systems
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