Oxidation of Amorphous Silicon for Superior Thin Film Transistors (OASIS TFT)

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概要

• 論文の詳細を見る
• 1996-08-26

著者

• MIYASAKA Mitsutoshi

  Seiko Epson Corporation, Technology Platform Research Center

• OHSHIMA Hiroyuki

  SEIKO EPSON CORPORATION, TFT Research Laboratory

• Ohshima Hiroyuki

  Seiko Epson Corporation Base Technology Research Center

• Ohshima H

  Seiko Epson Corp. Nagano Jpn

• Komatsu T

  Hokkaido Univ. Education Hakodate Jpn

• KOMATSU Tadakazu

  Seiko Epson Corporation, Analysis Center

• Miyasaka M

  Seiko Epson Corp. Nagano Jpn

• Miyasaka Mitsutoshi

  Seiko Epson Corporation Base Technology Research Center

関連論文

• Thin-Film Single-Crystal Growth of BiI_3 by a Hot Wall Technique
• Structural Properties of Nickel Metal-Induced Laterally Crystallized Silicon Films and Their Improvement Using Excimer Laser Annealing
• Low Temperature Poly-Si TFTs Using Solid Phase Crystallization of Very Thin Films and an Electron Cyclotron Resonance Chemical Vapor Deposition Gate Insulator
• Dry Thermal Oxidation of Polycrystalline and Amorphous Silicon Films for Application to Thin Film Transistors
• Dry Thermal Oxidation of Polycrystalline and Amorphous Silicon Films for Application to Thin Film Transistors
• Oxidation of Amorphous Silicon for Superior Thin Film Transistors
• Oxidation of Amorphous Silicon for Superior Thin Film Transistors (OASIS TFT)
• Effects of Semiconductor Thickness on Poly-Crystalline Silicon Thin Film Transistors
• Effects of Channel Thickness on Poly-Crystalline Silicon Thin Film Transistors
• Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors
• Wettability of Silicon Oxide with Poly-Crystalline Silicon
• Conduction Mechanism of Leakage Current Observed in Metal-Oxide-Semiconductor Transistors and Poly-Si Thin-Film Transistors
• TFT and Physical Properties of Poly-Crystalline Silicon Prepared by Very Low Pressure Chemical Vapour Deposition (VLPCVD)
• Structural Properties of Nickel Metal-Induced Laterally Crystallized Silicon Films and Their Improvement Using Excimer Laser Annealing
• Effects of Semiconductor Thickness on Poly-Crystalline Silicon Thin Film Transistors

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