Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-28
著者
-
MIYASAKA Mitsutoshi
Seiko Epson Corporation, Technology Platform Research Center
-
YUDASAKA Ichio
SEIKO EPSON CORPORATION, TFT Research Laboratory
-
OHSHIMA Hiroyuki
SEIKO EPSON CORPORATION, TFT Research Laboratory
-
Ohshima Hiroyuki
Seiko Epson Corporation Base Technology Research Center
-
Ohshima H
Seiko Epson Corp. Nagano Jpn
-
Komatsu T
Hokkaido Univ. Education Hakodate Jpn
-
Yudasaka I
Seiko Epson Corporation Active Device Research Laboratory
-
Yudasaka Ichio
Seiko Epson Corporation Tft
-
KOMATSU Tadakazu
Seiko Epson Corporation, Analysis Center
-
Shimodaira Akemi
Seiko Epson Corporation, Analysis Center
-
Miyasaka M
Seiko Epson Corp. Nagano Jpn
-
Miyasaka Mitsutoshi
Seiko Epson Corporation Base Technology Research Center
-
Shimodaira Akemi
Seiko Epson Corporation Analysis Center
関連論文
- Thin-Film Single-Crystal Growth of BiI_3 by a Hot Wall Technique
- Structural Properties of Nickel Metal-Induced Laterally Crystallized Silicon Films and Their Improvement Using Excimer Laser Annealing
- Low Temperature Poly-Si TFTs Using Solid Phase Crystallization of Very Thin Films and an Electron Cyclotron Resonance Chemical Vapor Deposition Gate Insulator
- Dry Thermal Oxidation of Polycrystalline and Amorphous Silicon Films for Application to Thin Film Transistors
- Dry Thermal Oxidation of Polycrystalline and Amorphous Silicon Films for Application to Thin Film Transistors
- Oxidation of Amorphous Silicon for Superior Thin Film Transistors
- Oxidation of Amorphous Silicon for Superior Thin Film Transistors (OASIS TFT)
- Effects of Semiconductor Thickness on Poly-Crystalline Silicon Thin Film Transistors
- Effects of Channel Thickness on Poly-Crystalline Silicon Thin Film Transistors
- Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors