Yudasaka Ichio | Seiko Epson Corporation Tft
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概要
関連著者
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Yudasaka Ichio
Seiko Epson Corporation Tft
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YUDASAKA Ichio
SEIKO EPSON CORPORATION, TFT Research Laboratory
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OHSHIMA Hiroyuki
SEIKO EPSON CORPORATION, TFT Research Laboratory
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Ohshima Hiroyuki
Seiko Epson Corporation Base Technology Research Center
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Ohshima H
Seiko Epson Corp. Nagano Jpn
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Yudasaka I
Seiko Epson Corporation Active Device Research Laboratory
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MIYASAKA Mitsutoshi
Seiko Epson Corporation, Technology Platform Research Center
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Miyasaka M
Seiko Epson Corp. Nagano Jpn
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Miyasaka Mitsutoshi
Seiko Epson Corporation Base Technology Research Center
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Nakazawa T
Nara Women's Univ. Nara
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NAKAZAWA Takashi
SEIKO EPSON CORPORATION, TFT Research Laboratory
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Nakazawa Takashi
Seiko Epson Corporation Tft Research Laboratory
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Komatsu T
Hokkaido Univ. Education Hakodate Jpn
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KOMATSU Tadakazu
Seiko Epson Corporation, Analysis Center
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Little Thomas
Seiko Epson Corporation Tft Research Laboratory
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Koike H
Nec Corp. Kanagawa Jpn
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TAKAHARA Ken-ichi
SEIKO EPSON CORPORATION, TFT Research Laboratory
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KOIKE Hideki
SEIKO EPSON CORPORATION, TFT Research Laboratory
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Itoh W
Research Laboratory Taito Co. Ltd.
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Itoh Wataru
Research Laboratory Taito Co.
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Koike H
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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Shimodaira Akemi
Seiko Epson Corporation, Analysis Center
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ITOH Wataru
MIM Research Laboratory
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Takahara Ken-ichi
Seiko Epson Corporation Tft Research Laboratory
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Ohshima Hiroyuki
Mim Research Laboratory
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Shimodaira Akemi
Seiko Epson Corporation Analysis Center
著作論文
- Low Temperature Poly-Si TFTs Using Solid Phase Crystallization of Very Thin Films and an Electron Cyclotron Resonance Chemical Vapor Deposition Gate Insulator
- Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors
- Wettability of Silicon Oxide with Poly-Crystalline Silicon
- TFT and Physical Properties of Poly-Crystalline Silicon Prepared by Very Low Pressure Chemical Vapour Deposition (VLPCVD)
- Rapid Thermal Annealing Technique for Polycrystalline Silicon Thin-Film Transistors