RBS Study of the Ni Film and Ni/Si(100) Interface Prepared by Biased dc Sputter-Deposition
スポンサーリンク
概要
著者
-
Safran Gyorgy
Research Institute For Technical Physics And Materials Science Hungarian Academy Of Sciences
-
PECZ Bela
Research Institute For Technical Physics and Material Science
-
Barna Peter
Research Institute For Technical Physics Of The Hungarian Academy Of Science
-
八木 栄一
The Institute Of Physical And Chemical Research(riken)
-
邱 宏
Department of Applied Physics and Chemistry, The University of Electro-Communications
-
橋本 満
Department of Applied Physics and Chemistry, The University of Electro-Communications
-
橋本 満
Department Of Applied Physics And Chemistry
-
邱 宏
Department Of Applied Physics And Chemistry
-
Pecz Bela
Research Institute For Technical Physics Of The Hungarian Academy Of Science
関連論文
- (Fe-Pt)-Oxide複合材料を用いた垂直二層膜媒体
- (Fe-Pt)-Oxide複合材料を用いた垂直二層膜媒体
- Structural Properties of Nickel Metal-Induced Laterally Crystallized Silicon Films and Their Improvement Using Excimer Laser Annealing
- RBS Study of the Ni Film and Ni/Si(100) Interface Prepared by Biased dc Sputter-Deposition
- Crystallization Process of the Antimony Layer Deposited onto the Thin Layer of Gold or Tellurium in a Vacuum of 10-5Pa
- Effect of Substrate Temperature on Crystallization in Evaporated Antimony Film
- Microstructure of Co-Cr-Nb-Pt Perpendicular Magnetic Recording Media with Ti and Pt Intermediate Layers
- Microstructure of CoCrNbPt media with Ti and Pt intermediate layers
- Critical Thickness for Crystallization in Evaporated Antimony Thin Film
- TEM analysis of the microstucture of CoCrNbPt perpendicular magnetic recording media : The effects of intermediate layers in the double layer media
- TEM study of the structure and morphology of CoCrNbPt double layer perpendicular magnetic media with Ti, Pt and Ti/Pt intermediate layers.
- 29a-PS-51 Ni/SiO / Ni/Si(001)及びNi/MgO薄膜の常温におけるSWR
- Characterization of Plasma-Induced Damage of Selectively Recessed GaN/InAlN/AlN/GaN Heterostructures Using SiCl4 and SF6
- Adhesion of Ni-Cu Films dc Biased Plasma-Sputter Deposited on MgO(001)
- Optical and Structural Characteristics of Virtually Unstrained Bulk-Like GaN
- Structural Properties of Nickel Metal-Induced Laterally Crystallized Silicon Films and Their Improvement Using Excimer Laser Annealing