橋本 満 | Department Of Applied Physics And Chemistry
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概要
関連著者
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橋本 満
Department Of Applied Physics And Chemistry
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橋本 満
Department of Applied Physics and Chemistry, The University of Electro-Communications
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邱 宏
Department Of Applied Physics And Chemistry
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鈴木 貴久
Komatsu Electronic Metals Co. Ltd.
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丸山 寛子
東洋大工
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Safran Gyorgy
Research Institute For Technical Physics And Materials Science Hungarian Academy Of Sciences
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神戸 謙次郎
電通大
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PECZ Bela
Research Institute For Technical Physics and Material Science
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Barna Peter
Research Institute For Technical Physics Of The Hungarian Academy Of Science
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八木 栄一
The Institute Of Physical And Chemical Research(riken)
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邱 宏
Department of Applied Physics and Chemistry, The University of Electro-Communications
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荒井 郁男
Department of Communiation Engineering Junior College
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橋本 満
電通大
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橋本 満
電気通信大学電子物性工学科物性工学講座
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橋本 満
Department Of Materials Science
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荒井 郁男
Department Of Applied Electronics
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神戸 謙次郎
Department Of Materials Science
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Pecz Bela
Research Institute For Technical Physics Of The Hungarian Academy Of Science
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武田 耕造
Graduate Students Of Department Of Materials Science
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皆川 冨士夫
Graduate Students of Department of Materials Science
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邱 宏
電通大電子物性
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中井 日佐司
電通大電子物性
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橋本 満
電通大電子物性
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石野 正樹
Department of Applied Physics and Chemistry
著作論文
- RBS Study of the Ni Film and Ni/Si(100) Interface Prepared by Biased dc Sputter-Deposition
- Crystallization Process of the Antimony Layer Deposited onto the Thin Layer of Gold or Tellurium in a Vacuum of 10-5Pa
- Effect of Substrate Temperature on Crystallization in Evaporated Antimony Film
- Critical Thickness for Crystallization in Evaporated Antimony Thin Film
- 29a-PS-51 Ni/SiO / Ni/Si(001)及びNi/MgO薄膜の常温におけるSWR
- Adhesion of Ni-Cu Films dc Biased Plasma-Sputter Deposited on MgO(001)