Improved Extrapolation Method of Ultrathin Oxide Thickness Using C-V Characteristics of Metal-Oxide-Senliconductor Device : Semiconductors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-05-15
著者
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HWANG Hyunsang
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Hwang H
Gwangju Inst. Sci. And Technol. Gwangju Kor
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Hwang H
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang Hyunsang
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Hwang Hyunsang
Advanced Technology Laboratory. Lg Semicon Co.
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Yang Hong
Microelectronics Centre School Of Electrical And Electronics Engineering Nanyang Technological Unive
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Yang Huan
Process Development Laboratory Electronic Devices Division
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YANG Hyundoek
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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CHANG Hyo
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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Chang H
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Yang H
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Yang Hyundoek
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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