Characterization of ZnO Nanowire Field Effect Transistors by Fast Hydrogen Peroxide Solution Treatment
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概要
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This study demonstrates a simple and fast method of the operation mode control for ZnO nanowire field effect transistors (FETs) with hydrogen peroxide (H2O2, 10%) solution treatment for 5--10 s. With this H2O2 treatment, the surface of ZnO nanowires was roughened as confirmed by transmission electron microscopy images and the defect level-related emission was increased from photoluminescence (PL) data. Correspondingly, the threshold voltage of H2O2-treated ZnO nanowire FETs shifted to the positive gate bias direction, leading a transition of the operation mode from depletion-mode to enhancement-mode. This H2O2 solution treatment can be a useful method for controlling the operation mode of ZnO nanowire FETs with a wide threshold voltage shift in a few second solution treatment.
- 2012-03-25
著者
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Hwang Hyunsang
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Lee Takhee
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Choe Minhyeok
School Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Lee Sangchul
Department Of Aerospace And Mechanical Engineering Korea Aerospace University
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Lee Takhee
Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Korea
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Park Woojin
School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea
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Kwon Taehyeon
Department of Nanobio Materials and Electronics, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea
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Yoon Jongwon
School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea
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Park Sangsu
School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea
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