Electrical Characteristics of TiO_2/ZrSi_xO_y Stack Gate Dielectric for Metal-Oxide-Semiconductor Device Applications : Semiconductors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-12-15
著者
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SIM Hyunjun
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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HWANG Hyunsang
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Sim H
Kwangju Inst. Sci. And Technol. Kwangju Kor
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Sim Hyunjun
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Hwang Hyunsang
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Jeon S
Samsung Advanced Inst. Technol. Suwon Kor
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JEON Sanghun
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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Jeon Sanghun
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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