Hwang H | Gwangju Inst. Sci. And Technol. Gwangju Kor
スポンサーリンク
概要
関連著者
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Hwang H
Gwangju Inst. Sci. And Technol. Gwangju Kor
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Hwang H
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang Hyunsang
Advanced Technology Laboratory. Lg Semicon Co.
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HWANG Hyunsang
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Hwang Hyunsang
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Yang Dooyoung
Jusung Engineering Co.
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Yang D
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Yang D
Jusung Engineering Co.
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Hwang Hyunsang
Advanced Technology Laboratory., LG Semicon Co.,
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Hwang Hyunsang
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Jeon S
Md Laboratory Samsung Advanced Institute Of Technology
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Choi S
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Choi Sangmoo
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Kwon Oh-kyong
Department Of Electrical Engineering Hanyang University
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LEE Young-Jong
Advanced Technology Laboratory., LG Semicon Co.
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JEONG Ju-Young
Department of Electrical Engineering The University of Suwon
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LEE Chang-Hyo
Department of Physics Hanyang University
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Lee sang-Gi
Dept. of Physics Hanyang Univ.
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Hwang Jeong-Mo
Advanced Technology Laboratory., LG Semicon Co.,
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Jeong Ju-Young
Dept. of Elec. Eng., The Univ. of Suwon.
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Kwon Oh-Kyong
Dept. of Elec. Eng., Hanyang Univ.
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Lee Chang-Hyo
Dept. of Physics Hanyang Univ.
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Kwon O‐k
Division Of Electrical And Computer Engineering Hanyang University
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Kwon Oh-keun
Semiconductor Process And Device Laboratory Dept. Of Electronic Engineering Chung-ang University
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Lee S‐g
Korea Univ. Chungnam Kor
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Lee Y‐j
Samsung Electronics Co. Ltd. Kyunggi‐do Kor
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Ahn Jae-gyung
R&d Division Hyundai Microelectronics Co.
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Ahn Jae-gyung
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang J‐m
Hyundai Microelectronics Co. Cheongju Kor
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Hwang Jeong-mo
Hyundai Electronics Industries Co.ltd. Memory R&d Division
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Hwang Jeong-mo
R&d Division Lg Semicon Co. Ltd.
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Hwang Jeong-mo
R&d Division Hyundai Microelectronics Co.
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Lee Young-jong
Lg Semicon. Ltd.
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Lee Young-jong
Advanced Technology Laboratory Lg Semicon Co. Ltd.
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Yang Hong
Microelectronics Centre School Of Electrical And Electronics Engineering Nanyang Technological Unive
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Yang Huan
Process Development Laboratory Electronic Devices Division
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YANG Hyundoek
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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Lee Young-jong
Advanced Technology Laboratory. Lg Semicon Co.
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Hwang Jeong-mo
Advan. Tech. Lab. Lg Semicon Co. Ltd.
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Hwang J.-m.
Hyundai Electronics Industries Co.ltd. Memory R&d Division
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CHANG Hyo
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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Chang H
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Im Kiju
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Yang H
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Jung Heungsang
Dit Laboratory Daewoo Electronics Co. Ltd.
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Yang Hyundoek
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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CHOI Sangmoo
Department of Materials Science anti Engineering, Kwangju Institute of Science and Technology
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Kim Chungwoo
Md Laboratory Samsung Advanced Institute Of Technology
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JEON Sanghun
MD laboratory, Samsung Advanced Institute of Technology
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SIM Hyunjun
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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PARK Hokyung
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Song Young
Electrotechnical Laboratory:department Of Physics Seoul National University
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Sim Hyunjun
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Park Hokyung
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Shim Kyu-hwan
Electronics And Telecommunications Research Institute
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Ahn Jae-gyung
Ulsi Laboratory Lg Semicon Co. Ltd.
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Park Kyung
Electronics And Telecommunications Research Institute
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Yang Dooyoung
Advanced Technology Department, ULSI Laboratory, LG Semicon Co., Ltd.
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JEON Sanghun
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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HWANG Hyunsang
ULSI Laboratory of LG Semicon Co. Ltd.
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Yang Dooyoung
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Yang Dooyoung
Ulsi Laboratory Lg Semicon Co. Ltd.
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Samantaray Chandan
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Im Kiju
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Lim Jung-wook
Electronics And Telecommunications Research Institute
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Jeon Sanghun
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Jeon Sanghun
Dept. Of Materials Sci. & Eng. Kwangju Institute Of Science And Technology
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Kim Juhyung
Md Laboratory Samsung Advanced Institute Of Technology
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JUNG Hyungsuk
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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JUNG Hyungsuk
Dept. of Materials Sci. & Eng., Kwangju Institute of Science and Technology
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IM Kiju
Dept. of Materials Sci. & Eng., Kwangju Institute of Science and Technology
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HWANG Hyunsang
Dept. of Materials Sci. & Eng., Kwangju Institute of Science and Technology
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YOUN Kang-Sik
ULSI Laboratory, LG Semicon Co.
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LEE Dong
Advanced Technology Department, ULSI Laboratory, LG Semicon Co., Ltd.
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Youn Kang-sik
Ulsi Laboratory Lg Semicon Co.
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Hwang Hyunsang
Ulsi Laboratory Lg Semicon Co.
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JANG Man
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Jang Man
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Cho Myungjun
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Song Young
Electronics And Telecommunications Research Institute
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Lee Dong
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Cho Myungun
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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YANG Dooyoung
Jusung Engineering
著作論文
- Effects of Low Temperature Interlayer Dielectric Films on the Gate Oxide Quality of Deep Submicron MOSFET's
- Effects of Low Temperature Interlayer Dielectric Films on the Gate Oxide Quality of Deep Submicron MOSFET's
- Experimental Determination of Ultrathin Oxide Thickness Using Conventional Capacitance-Voltage Analysis
- Improved Extrapolation Method of Ultrathin Oxide Thickness Using C-V Characteristics of Metal-Oxide-Senliconductor Device : Semiconductors
- Electrical Characteristics of ZrO_2 Gate Dielectric Deposited on Ultrathin Silicon Capping Layer for SiGe Metal-Oxide-Semiconductor Device Applications
- Electrical and Reliability Characteristics of an Ultrathin TaO_xN_y Gate Dielectric Prepared by O_3 Annealing
- High Quality Ultrathin TaO_xN_y Gate Dielectric Prepared by Nitridation of Ta_2O_5
- Electrical Characteristics of Ultra Short Channel CMOS Device for Giga-bit DRAM Applications
- Effect of Channeling of Halo Ion Implantation on Threshold Voltage Instability of MOSFET's
- High Pressure H_2/D_2 Annealed SONOS Nonvolatile Memory Devices
- Improved Charge-Trapping Nonvolatile Memory with Dy-doped HfO2 as Charge-Trapping Layer and Al2O3 as Blocking Layer