Lee S‐g | Korea Univ. Chungnam Kor
スポンサーリンク
概要
関連著者
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Lee S‐g
Korea Univ. Chungnam Kor
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LEE Young-Jong
Advanced Technology Laboratory., LG Semicon Co.
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Lee Y‐j
Samsung Electronics Co. Ltd. Kyunggi‐do Kor
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Lee Young-jong
Lg Semicon. Ltd.
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Lee Young-jong
Advanced Technology Laboratory Lg Semicon Co. Ltd.
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Lee Young-jong
Advanced Technology Laboratory. Lg Semicon Co.
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Hwang Jeong-mo
R&d Division Hyundai Microelectronics Co.
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Hwang Jeong-mo
Advan. Tech. Lab. Lg Semicon Co. Ltd.
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Hwang J.-m.
Hyundai Electronics Industries Co.ltd. Memory R&d Division
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Kwon Oh-kyong
Department Of Electrical Engineering Hanyang University
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JEONG Ju-Young
Department of Electrical Engineering The University of Suwon
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LEE Chang-Hyo
Department of Physics Hanyang University
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Kwon O‐k
Division Of Electrical And Computer Engineering Hanyang University
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Kwon Oh-keun
Semiconductor Process And Device Laboratory Dept. Of Electronic Engineering Chung-ang University
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LEE Hi-Deok
Advanced Technology Laboratory., LG Semicon Co.
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Lee sang-Gi
Dept. of Physics Hanyang Univ.
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Hwang Jeong-Mo
Advanced Technology Laboratory., LG Semicon Co.,
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Jeong Ju-Young
Dept. of Elec. Eng., The Univ. of Suwon.
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Kwon Oh-Kyong
Dept. of Elec. Eng., Hanyang Univ.
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Lee Chang-Hyo
Dept. of Physics Hanyang Univ.
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Lee Hi-deok
R&d Division Lg Semicon Co. Ltd.
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Lee Hi-deok
Advanced Technology Laboratory Lg Semicon Co. Ltd.
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Lee Hi-deok
Advanced Technology Laboratory. Lg Semicon Co.
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Hwang J‐m
Hyundai Microelectronics Co. Cheongju Kor
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Hwang Jeong-mo
Hyundai Electronics Industries Co.ltd. Memory R&d Division
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Hwang Jeong-mo
R&d Division Lg Semicon Co. Ltd.
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Lee H‐d
Chungnam National Univ. Taejon Kor
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EO Yungseon
Department of Electrical Engineering Hanyang University
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Hwang Hyunsang
Advanced Technology Laboratory., LG Semicon Co.,
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Kang Dae-gwan
R&d Division Lg Semicon Co. Ltd.
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HWANG Hyunsang
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Lee Sang-gi
R&d Division Hyundai Microelectronics Co.
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Hong Sung-kwon
R&d Division Hyundai Microelectronics Co.
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Ahn Jae-gyung
R&d Division Hyundai Microelectronics Co.
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Ahn Jae-gyung
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang H
Gwangju Inst. Sci. And Technol. Gwangju Kor
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Hwang H
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang Hyunsang
Advanced Technology Laboratory. Lg Semicon Co.
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LEE Seung-Ho
Advanced Technology Laboratory, LG Semicon Co., Ltd.
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Hwang Hyunsang
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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LEE Sang-Gi
Department of Physics Hanyang University
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LEE Kye-Nam
Advan. Tech. Lab., LG Semicon Co., Ltd.
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AHN Jae-Gyung
R&D Division, LG Semicon. Co., Ltd.
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Yang W
Lg Semicon Co. Ltd. Cheongju‐si Kor
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Yang Wouns
Advanced Technology Laboratory Lg Semicon Co.
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Yang Wouns
Advanced Technology Development Team
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Yang Wouns
Advanced Technology Laboratory Lg Semicon Co. Ltd.
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Lee Donghoon
Advansed Technology Laboratory. Lg Semicon Co.
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Son Jeong-hwan
Advanced Technology Laboratory Lg Semicon Co. Ltd.
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Kang Dae-Gwan
R&D Division, LG Semicon Co., Ltd.
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Hwang Jeong-Mo
R&D Division, LG Semicon Co., Ltd.
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Son Jung-hwan
R&d Division Hyundai Microelectronics Co.
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LEE Sang-Gi
Advanced Technology Laboratory, LG Semicon Co., Ltd.
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EO Yungseon
Dept. of Elec. Eng., Hanyang Univ.
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Lee Kyong-ha
R&d Division Hyundai Microelectronics Co.
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HONG Sung-Kwon
R&D Division, Hyundai MicroElectronics Co.
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LEE Sang-Gi
R&D Division, Hyundai MicroElectronics Co.
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LEE Kyong-Ha
R&D Division, Hyundai MicroElectronics Co.
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SON Jung-Hwan
R&D Division, Hyundai MicroElectronics Co.
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HONG Sung-Kwon
LG Semicon Co., Ltd, R&D Division
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LEE Sang-Gi
LG Semicon Co., Ltd, R&D Division
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AHN Jae-Gyung
LG Semicon Co., Ltd, R&D Division
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KANG Dae-Gwan
LG Semicon Co., Ltd, R&D Division
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HWANG Jeong-Mo
LG Semicon Co., Ltd, R&D Division
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Lee Kye-nam
Advansed Technology Laboratory. Lg Semicon Co.
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Lee Kye-nam
Advan. Tech. Lab. Lg Semicon Co. Ltd.
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Kwon Oh-kyong
Department Of Electoronic Engineering Hanyang University
著作論文
- Trade-Off between Hot Carrier Effect and Current Driving Capability Due to Drain Contact Structures in Deep Submicron MOSFETs
- Effects of Low Temperature Interlayer Dielectric Films on the Gate Oxide Quality of Deep Submicron MOSFET's
- Effects of Low Temperature Interlayer Dielectric Films on the Gate Oxide Quality of Deep Submicron MOSFET's
- Shallow Trench Isolation Characteristics with High-Density-Plasma Chemical Vapor Deposition Gap-Fill Oxide for Deep-Submicron CMOS Technologies
- Characterization of Corner-Induced Leakage Current of a Shallow Silicided n^+/p Junction for Quarter-Micron MOSFETs
- Study of Drain Contact Structure Dependent Deep Submicron MOSFET Reliability by Photon Emission Analysis
- Impact of Nitrogen Implantation in Lightly Doped Drain(NIL)on Deep Sub-Micron CMOS Devices
- The Impact of Nitrogen Implantation at LDD(NIL) on Deep Sub-Micron CMOS Devices