Yang Wouns | Advanced Technology Laboratory Lg Semicon Co.

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著作論文

Shallow Trench Isolation Characteristics with High-Density-Plasma Chemical Vapor Deposition Gap-Fill Oxide for Deep-Submicron CMOS Technologies
RC-FinFET (Recessed Channel FinFET) Cell Transistor Technology for Future Generation DRAMs
Shallow Trench Isolation Characteristics with High-Density-Plasma (HDP) CVD Oxide for Deep-Submicron CMOS Technologies
Shallow Trench Isolation Characteristics with High-Density-Plasma (HDP) CVD Oxide for Deep-Submicron CMOS Technologies

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