Chung Sungwoong | Device Group, Process Group

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概要

• 同名の論文著者
• Device Group, Process Groupの論文著者

関連著者

• Yang W

  Lg Semicon Co. Ltd. Cheongju‐si Kor

• Yang Wouns

  Advanced Technology Laboratory Lg Semicon Co.

• Yang Wouns

  Advanced Technology Development Team

• Lee Youngjong

  Advanced Technology Laboratory Lg Semicon Co.

• Park Jin

  System Ic Research Center Korea Electronics Technology Institute

• Park Jinwon

  System Ic Research Center Korea Electronics Technology Institute

• Lee Seungho

  Advanced Technology Laboratory, LG Semicon Co.,

• Jung Kuchul

  Advanced Technology Laboratory, LG Semicon Co.,

• Chung Sungwoong

  Device Group, Process Group

• Choe Jeongdong

  Device Group, Process Group

• Park Jinwon

  Device Group, Process Group

• Lee S

  Hanyang Univ. Seoul Kor

• LEE Seungho

  Device Group, Advanced Technology Lab., LG Semicon Co.

• JUNG Kuchul

  Device Group, Advanced Technology Lab., LG Semicon Co.

• CHUNG Sungwoong

  Process Group, Advanced Technology Lab., LG Semicon Co.

• Jung Kuchul

  Advanced Technology Laboratory Lg Semicon Co.

• Choe Jeongdong

  Device Group Process Group

• Yang Wouns

  Lg Semicon. Ltd.

• Park Jinwon

  Device Group Process Group

• Chung Sungwoong

  Device Group Process Group

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著作論文

• Shallow Trench Isolation Characteristics with High-Density-Plasma (HDP) CVD Oxide for Deep-Submicron CMOS Technologies
• Shallow Trench Isolation Characteristics with High-Density-Plasma (HDP) CVD Oxide for Deep-Submicron CMOS Technologies

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