Yang D | Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
スポンサーリンク
概要
関連著者
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HWANG Hyunsang
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Hwang H
Gwangju Inst. Sci. And Technol. Gwangju Kor
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Hwang H
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang Hyunsang
Advanced Technology Laboratory. Lg Semicon Co.
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Yang Dooyoung
Jusung Engineering Co.
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Yang D
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Yang D
Jusung Engineering Co.
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Ahn Jae-gyung
R&d Division Hyundai Microelectronics Co.
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Ahn Jae-gyung
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Im Kiju
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Jung Heungsang
Dit Laboratory Daewoo Electronics Co. Ltd.
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Hwang Hyunsang
Advanced Technology Laboratory., LG Semicon Co.,
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SIM Hyunjun
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Sim Hyunjun
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Ahn Jae-gyung
Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang Hyunsang
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Hwang Hyunsang
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Yang Dooyoung
Advanced Technology Department, ULSI Laboratory, LG Semicon Co., Ltd.
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HWANG Hyunsang
ULSI Laboratory of LG Semicon Co. Ltd.
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Yang Dooyoung
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Yang Dooyoung
Ulsi Laboratory Lg Semicon Co. Ltd.
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Im Kiju
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Jeon Sanghun
Dept. Of Materials Sci. & Eng. Kwangju Institute Of Science And Technology
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JUNG Hyungsuk
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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JUNG Hyungsuk
Dept. of Materials Sci. & Eng., Kwangju Institute of Science and Technology
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IM Kiju
Dept. of Materials Sci. & Eng., Kwangju Institute of Science and Technology
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HWANG Hyunsang
Dept. of Materials Sci. & Eng., Kwangju Institute of Science and Technology
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YOUN Kang-Sik
ULSI Laboratory, LG Semicon Co.
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LEE Dong
Advanced Technology Department, ULSI Laboratory, LG Semicon Co., Ltd.
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Youn Kang-sik
Ulsi Laboratory Lg Semicon Co.
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Hwang Hyunsang
Ulsi Laboratory Lg Semicon Co.
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Lee Dong
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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YANG Dooyoung
Jusung Engineering
著作論文
- Electrical and Reliability Characteristics of an Ultrathin TaO_xN_y Gate Dielectric Prepared by O_3 Annealing
- High Quality Ultrathin TaO_xN_y Gate Dielectric Prepared by Nitridation of Ta_2O_5
- Electrical Characteristics of Ultra Short Channel CMOS Device for Giga-bit DRAM Applications
- Effect of Channeling of Halo Ion Implantation on Threshold Voltage Instability of MOSFET's