Lim Jung-wook | Electronics And Telecommunications Research Institute
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概要
関連著者
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Lim Jung-wook
Electronics And Telecommunications Research Institute
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HWANG Hyunsang
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology
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Song Young
Electrotechnical Laboratory:department Of Physics Seoul National University
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Shim Kyu-hwan
Electronics And Telecommunications Research Institute
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Hwang H
Gwangju Inst. Sci. And Technol. Gwangju Kor
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Hwang H
Advanced Technology Department Ulsi Laboratory Lg Semicon Co. Ltd.
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Hwang Hyunsang
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Hwang Hyunsang
Advanced Technology Laboratory. Lg Semicon Co.
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Park Kyung
Electronics And Telecommunications Research Institute
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JEON Sanghun
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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PARK Chan
Electronics and Telecommunications Research Institute
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Jeon Sanghun
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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CHOI Sangmoo
Department of Materials Science anti Engineering, Kwangju Institute of Science and Technology
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Jeon S
Md Laboratory Samsung Advanced Institute Of Technology
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Choi S
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Choi Sangmoo
Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology
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Song Young
Electronics And Telecommunications Research Institute
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Lim Jung-Wook
Electronics and Telecommunications Research Institute (ETRI), 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
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Yu Han
Electronics and Telecommunications Research Institute (ETRI), 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
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Pi Ung
Electronics and Telecommunications Research Institute (ETRI), 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
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Ryu Min
Electronics and Telecommunications Research Institute (ETRI), 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
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Choi Sung-Yool
Electronics and Telecommunications Research Institute (ETRI), 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
著作論文
- Electrical Characteristics of ZrO_2 Gate Dielectric Deposited on Ultrathin Silicon Capping Layer for SiGe Metal-Oxide-Semiconductor Device Applications
- Fabrication of Nano-Gap Electrode Pairs Using Atomic-Layer-Deposited Sacrificial Layer and Shadow Deposition