Electron Mobility Degradation Mechanisms in HfSiON MISFETs under the Real Operating Condition
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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ISHIHARA Takamitsu
Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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TAKAYANAGI Mariko
SoC Research & Development Center, Toshiba Corporation Semiconductor Company
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Yamaguchi Takeshi
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Takayanagi Mariko
Advanced Cmos Technology Dept. Center For Semiconductor Research & Development Semiconductor Com
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Takayanagi Mariko
Semiconductor Company Toshiba Corporation
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