Quantitative Understanding of Electron Mobility Limited by Coulomb Scattering in MOSFETs with N_2O and NO Oxynitrides
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概要
- 論文の詳細を見る
- 2000-08-28
著者
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ISHIHARA Takamitsu
Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Kondo Masaki
Semiconductor company, System LSI Division, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokoham
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Kondo Masaki
Semiconductor Company System Lsi Division Toshiba Corporation
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiha Corporation
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Takagi Shin-ichi
Advanced LSI Technology Laboratory, Research & Development Center, Toshiba Corporation
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