ISHIHARA Takamitsu | Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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概要
- ISHIHARA Takamitsuの詳細を見る
- 同名の論文著者
- Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporationの論文著者
関連著者
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ISHIHARA Takamitsu
Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Takagi S
Process & Manufacturing Center Semiconductor Company Toshiba Corporation
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KOGA Junji
Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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Koga J
Advanced Lsi Technology Laboratory Research And Development Center Toshiba Corporation
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Koga Junji
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Research And Development Center Toshiba Corporation
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TAKAGI Shin-ichi
Department of Frontier Informatics, Graduate School of Frontier Science, The University of Tokyo
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Takagi Shin-ichi
Department Of Electrical Engineering University Of Tokyo
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NAKABAYASHI Yukio
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Kondo Masaki
Semiconductor company, System LSI Division, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokoham
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Kondo Masaki
Semiconductor Company System Lsi Division Toshiba Corporation
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Nakabayashi Yukio
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Nakabayashi Yukio
Advanced Lsi Technology Laboratory Research And Development Center Toshiba Corporation
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Takayanagi Mariko
Advanced Cmos Technology Dept. Center For Semiconductor Research & Development Semiconductor Com
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiha Corporation
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Takayanagi Mariko
Semiconductor Company Toshiba Corporation
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YAMAGAMI Hiroshi
Department of Physics, Faculty of Science, Kyoto Sangyo University
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SANO Nobuyuki
Institute of Applied Physics, University of Tsukuba
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Sano Nobuyuki
Univ. Tsukuba Ibaraki Jpn
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TAKAGI Shin-ichi
Advanced LSI Technology Laboratory, Toshiba Corporation
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SHIMIZU Takashi
Process & Manufacturing Center, Semiconductor Company, Toshiba Corporation
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UCHIDA Ken
Advanced LSI Technology Laboratory, Research & Development Center, Toshiba Corporation
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Yamagami Hiroshi
Department Of Neurology Stroke Center Kobe City Medical Center General Hospital
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YASUHARA HIROSHI
Department of Surgery, Ichihara Hospital, Teikyo University School of Medicine
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Tanimoto Hiroyoshi
Advanced Cmos Technology Dept. Center For Semiconductor Research & Development Semiconductor Com
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Yamagami Hiroshi
Department Of Physics Faculty Of Science Kyoto-sangyo University
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Uchida K
Advanced Lsi Technology Laboratory Toshiba Corporation
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Koyama Masato
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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TAKAYANAGI Mariko
SoC Research & Development Center, Toshiba Corporation Semiconductor Company
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Yamaguchi Takeshi
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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TAKAYANAGI Mariko
Advanced CMOS Technology Dept., Center for Semiconductor Research & Development, Semiconductor Compa
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Yasuhara Hiroshi
Department Of Physics Graduate School Of Science Tohoku University
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Uchida Ken
Advanced Lsi Technology Laboratory Toshiba Corporation
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Uchida Ken
Corporate R&d Center Toshiba Corporation
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Uchida Ken
Advanced LSI laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Takagi Shin-ichi
Advanced LSI Technology Laboratory, Research & Development Center, Toshiba Corporation
著作論文
- Influence of High Dielectric Constant in Gate Insulator on Remote Coulomb Scattering due to Gate Impurities in Si MOS Inversion Layer
- Physical Origins of Surface Carrier Density Dependences of Interface- and Remote-Coulomb Scattering Mobility in Si MOS Inversion Layer
- Unified Roughness Scattering Model Incorporating Scattering Component Induced by Thickness Fluctuation in SOI MOSFETs
- Quantitative Understanding of Mobility Degradation in High Effective Electric Field Region in MOSFETs with Ultra-thin Gate Oxides
- Quantitative Examination of Mobility Lowering Associated with Ultrathin Gate Oxides in Silicon Metal-Oxide-Semiconductor Inversion Layer
- Coulomb and Phonon Scattering Processes in Metal-Oxide-Semiconductor Inversion Layers : Beyond Matthiessen's Rule
- Self-consistent Calculation of the Quasi-particle Energy Spectrum of Sodium using the Correlated Hartree-Fock Method
- Study on Carrier Transport Limited by Coulomb Scattering due to Charged Centers in HfSiON MISFETs
- Electron Mobility Degradation Mechanisms in HfSiON MISFETs under the Real Operating Condition
- Quantitative Understanding of Electron Mobility Limited by Coulomb Scattering in Metal Oxide Semiconductor Field Effect Transistors with N2O and NO Oxynitrides
- Quantitative Understanding of Electron Mobility Limited by Coulomb Scattering in MOSFETs with N_2O and NO Oxynitrides