SHIMIZU Takashi | Process & Manufacturing Center, Semiconductor Company, Toshiba Corporation
スポンサーリンク
概要
関連著者
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SHIMIZU Takashi
Process & Manufacturing Center, Semiconductor Company, Toshiba Corporation
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NAKABAYASHI Yukio
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation
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Takagi S
Process & Manufacturing Center Semiconductor Company Toshiba Corporation
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Uchitomi Naotaka
Department Of Electrical Engineering Nagaoka University Of Technology
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ISHIHARA Takamitsu
Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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KOGA Junji
Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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Toyoshima Yoshiaki
System Lsi Research & Development Center Toshiba Corporation Semiconductor Company
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Koga J
Advanced Lsi Technology Laboratory Research And Development Center Toshiba Corporation
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Koga Junji
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Fukui Hironobu
System Lsi Research & Development Center Toshiba Corporation Semiconductor Company
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TAKAYANAGI Mariko
System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
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MORI Shinji
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Research And Development Center Toshiba Corporation
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Mori Shinji
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Nakabayashi Yukio
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Nakabayashi Yukio
Advanced Lsi Technology Laboratory Research And Development Center Toshiba Corporation
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Takayanagi Mariko
System Lsi Research & Development Center Toshiba Corporation Semiconductor Company
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Shimizu Takashi
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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MIZUSHIMA Ichiro
Process & Manufactruing Engineering Center, Semiconductor Company, Toshiba Corporation
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Mizushima Ichiro
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kasahara Kiyotaka
Department of Electrical Engineering, Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-2188, Japan
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Saki Kazuo
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Uchitomi Naotaka
Department of Electrical Engineering, Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-2188, Japan
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Saki Kazuo
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- Influence of High Dielectric Constant in Gate Insulator on Remote Coulomb Scattering due to Gate Impurities in Si MOS Inversion Layer
- Formation of Ultrathin SiON Films on Si Substrates Having Different Orientations
- Carrier Transport of SiN Gate Dielectrics for Dual-Gate CMOSFETs