The Highly Reliable Evaluation of Mobility in an Ultra Thin High-k Gate Stack with an Advanced Pulse Measurement Method
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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Nishiyama Akira
Advanced LSI Technology Laboratory, Corporate R & D Center, Toshiba Corporation
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Koyama Masato
Advanced LSI Technology Laboratory, Corporate R & D Center, Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Koyama Masato
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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IIJIMA Ryosuke
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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TAKAYANAGI Mariko
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Takayanagi Mariko
Advanced Cmos Technology Dept. Center For Semiconductor Research & Development Semiconductor Com
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Takayanagi Mariko
Semiconductor Company Toshiba Corporation
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