Exact Trap Level Estimation of HfSiON Films with Various Atomic Compositions

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• Koike Mitsuo

  Advanced Lsi Technology Laboratory Corporate Research&development Center Toshiba Corporation

• Nishiyama Akira

  Advanced LSI Technology Laboratory, Corporate R & D Center, Toshiba Corporation

• KAMIMUTA Yuuichi

  Advanced LSI Technology Laboratory, Toshiba Corp.

• Mitani Yuichiro

  Advanced Lsi Technology Laboratory Toshiba Corporation

• Mitani Yuichiro

  Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation

• Mitani Yuichiro

  Advanced Lsi Technology Laboratory Corporate Research&development Center Toshiba Corporation

• Nishiyama Akira

  Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation

• Nishiyama Akira

  Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation

• Koike Masahiro

  Advanced Lsi Technology Laboratory Corporate Research&development Center Toshiba Corporation

• Kamimuta Yuuichi

  Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation

• INO Tsunehiro

  Advanced LSI Technology Laboratory, Corporate Research and Development Center, TOSHIBA Corporation

• Ino Tsunehiro

  Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation

• Kamimuta Yuuichi

  Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corporation

• Ino Tsunehiro

  Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corporation

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