Measurement of Electron Mobility in Hydrogenated Amorphous-Silicon Using 4-Terminal Transistor Structures
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1984-04-20
著者
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Matsumura Masakiyo
Department of Physical Electronics, Tokyo Institute of Technology
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UCHIDA Yasutaka
Department of Electronics and Information Science, Teikyo University of Science and Technology
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Matsumura Masakiyo
Department Of Physical Electronics Tokyo Institute Of Technology
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Matsumura Masakiyo
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Uchida Yasutaka
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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- A Novel Phase-Modulated Excimer-Laser Crystallization Method of Silicon Thin Films
- Preparation of Organic Silica Films with Low Dielectric Constant from the Liquid Phase
- Excimer-Laser-Induced Lateral-Growth of Silicon Thin-Films
- Excimer-Laser-Produced Single-Crystal Silicon Thin-Film Transistors
- Step-Covertage Characteristics of Silicon-Dioxide Films Formed by a New Low-Temperature Chemical-Vapor-Deposition Method
- Chemical Vapor Deposition of Hydrogen-Free Silicon-Dioxide Films
- Low-Temperature CVD of Silicon Dioxide by Alkoxyl-Silane-Isocyanate
- Low-Temperature CVD of SiO_2 by Alkoxy-Silane-Iso-Cyanate
- Chemical Vapor Deposition of Amorphous Silicon Using Tetrasilane
- Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films
- Low-Temperature Chemical Vapor Deposition of Silicon Nitride Using A New Source Gas : Hydrogen Azide
- Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors
- The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by Chemical-Vapor-Deposition Method
- Chemical Vapour Deposition of Amorphous Silicon with Silanes for Thin Film Transistors : The Influence of the Amorphous Silicon Deposition Temperature
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- Optimization of Chemical Vapor Deposition Conditions of Amorphous-Silicon Films for Thin-Film Transistor Application
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- Normal-Pressure and Low-Temperature Thermal Oxidation of Silicon
- Diagnostic Study of VHF Plasma and Deposition of Hydrogenated Amorphous Silicon Films
- Generation of Electron Cyclotron Resonance Plasma in the VHF Band
- Atomic Layer Etching of Silicon by Thermal Desorption Method
- Chemical Vapor Deposition Based Preparation on Porous Silica Films
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- Application of Hydrogenated Amorphous-Silicon to Bipolar Transistors
- High-Performance Poly-Si Thin-Film Transistors with Excimer-Laser Annealed Silicon-Nitride Gate
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- Preparation of Giant-Grain Seed Layer for Poly-Silicon Thin-Film Solar Cells
- Theory of Charge Transfer in Amorphous-Silicon Charge-Coupled Devices
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