Chemical-Vapor Deposition of OH-free and Low-k Organic-Silica Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-15
著者
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菅原 聡
Department Of Electronic Engineering The University Of Tokyo
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松村 正清
東京工業大学工学部:(現)(株)液晶先端技術開発センター
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UCHIDA Yasutaka
Department of Electronics and Information Science, Teikyo University of Science and Technology
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Nagai Tomonori
Department of Legal Medicine, Kitasato University School of Medicine
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TAGUCHI Kohshi
Department of Electronics and Information Science, Teikyo University of Science and Technology
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SUGAHARA Satoshi
Depertment of Physical Electronics, Tokyo Institute of Technology
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MATSUMURA Masakiyo
Depertment of Physical Electronics, Tokyo Institute of Technology
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松村 正清
東京工業大学工学部電子物理科
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Nagai Tomonori
Department Of Electronics And Information Science Teikyo University Of Science And Technology
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Nagai T
Department Earth And Space Science Graduate School Of Science Osaka University
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Uchida Y
Aichi Inst. Technol. Toyota Jpn
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Taguchi K
Department Of Electronics And Electrical Engieering Fukuyama University
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Uchida Y
Department Of Electrical Engineering Aichi Institute Of Technology Toyota
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Uchida Y
Yamaguchi Univ. Yamaguchi Jpn
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Uchida Yasutaka
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Taguchi Kohshi
Department of Electronics and Electrical Engieering, Fukuyama University
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