Surface Preparation, Growth, and Interface Control of Ultrathin Gate Oxides
スポンサーリンク
概要
- 論文の詳細を見る
- 1998-09-07
著者
-
Nishioka Yasushiro
Texas Instruments Tsukuba R & D Center
-
Nishioka Yasushiro
Tsukuba Research And Development Center Japan Texas Instruments
-
松村 正清
東京工業大学工学部:(現)(株)液晶先端技術開発センター
-
Kobayashi Hidehiko
Faculty Of Engineering Yamanashi University
-
Sakoda Tatsuya
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
-
Hoshino Tyuji
Faculty Of Pharmaceutical Sciences Chiba University
-
KOBAYASHI Hikaru
Institute of Scientific and Industrial Research, Osaka University
-
MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
-
MIKI Kazushi
Nanotechnology Research Institute-AIST
-
Namba K
Texas Instruments Ibaraki Jpn
-
Namba Kenji
Texas Instruments Tsukuba R & D Center
-
MATSUMURA Mieko
Texas Instruments Tsukuba R & D Center
-
SAKODA Tomoyuki
Texas Instruments Tsukuba R & D Center
-
KUMAGAI Yoshinao
Texas Instruments Tsukuba Research and Development Center Limited
-
KOMEDA Tadahiro
Texas Instruments Tsukuba Research and Development Center Limited
-
ANDO Atsushi
Electrotechnical Laboratory (ETL)
-
MIKI Kazushi
Electrotechnical Laboratory (ETL)
-
Komeda Tadahiro
Riken (the Institute Of Physical And Chemical Research)
-
Komeda Tadahiro
Texas Instruments Tsukuba R & D Center
-
Komeda Tadahiro
Tsukuba Research And Development Center Texas Instruments
-
松村 正清
東京工業大学工学部電子物理科
-
Nishioka Yasushiro
Texas Instruments Japan Limited Tsukuba Research And Development Center
-
Kobayashi H
Nagaoka Univ. Technol. Niigata Jpn
-
Miki K
Electrotechnical Laboratory (etl)
-
Miki Kazushi
National Institute Of Materials Science (nims)
-
Miki Kazushi
Aist
-
Miki Kazushi
Nanoarchitecture Group Organic Nanomaterials Center National Institute For Materials Science
-
Miki Kazushi
Electrotechnical Laboratory
-
Sakoda T
National College Of Technology
-
Nishioka Y
Tsukuba Research And Development Center Japan Texas Instruments
-
Sakoda Tadanori
Department Of Electronics And Control Engineering Kitakyushu National College Of Technology
-
Kobayashi Hikaru
Institute Of Scientific And Industrial Research Osaka University
-
Sakoda Tomoyuki
Si Technology Development Texas Instruments Inc.
-
Sakoda Tomoyuki
National College of Technology
関連論文
- 次世代Si薄膜デバイスを目指した超巨大結晶粒形成法
- Electron Temperature in RF Discharge Plasma of CF_4/N_2 Mixture
- Mass Spectrometry of Discharge Products at 13.56 MHz in SF_6 Gas ( Plasma Processing)
- Spatiotemporal Profiles of Optical Emission Spectra in CF_4 Discharges at 1 MHz ( Plasma Processing)
- Studies of a Magnetic Neutral Loop Discharge Based on Laser Diagnostics of Electron Behavior and Atomic Processes
- Electron Temperature and Density Profiles in a Neutral Loop Discharge Plasma
- エキシマレーザを用いた巨大結晶粒Si薄膜の形成
- 次世代Si薄膜デバイスを目指した超巨大結晶粒形成法
- Two-Dimensionally Position-Controlled Excimer-Laser-Crystallization of Silicon Thin Films on Glassy Substrate
- A Proposed Organic-Silica Film for Inter-Metal-Dielectric Application